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[1,2-Dimethyl-3-[2-oxo-2-(2-oxooxolan-3-yl)oxyethyl]cyclopent-2-en-1-yl]methanesulfonic acid

中文名称
——
中文别名
——
英文名称
[1,2-Dimethyl-3-[2-oxo-2-(2-oxooxolan-3-yl)oxyethyl]cyclopent-2-en-1-yl]methanesulfonic acid
英文别名
[1,2-dimethyl-3-[2-oxo-2-(2-oxooxolan-3-yl)oxyethyl]cyclopent-2-en-1-yl]methanesulfonic acid
[1,2-Dimethyl-3-[2-oxo-2-(2-oxooxolan-3-yl)oxyethyl]cyclopent-2-en-1-yl]methanesulfonic acid化学式
CAS
——
化学式
C14H20O7S
mdl
——
分子量
332.37
InChiKey
DMEONPMZNUMMBY-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.3
  • 重原子数:
    22
  • 可旋转键数:
    6
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.71
  • 拓扑面积:
    115
  • 氢给体数:
    1
  • 氢受体数:
    7

文献信息

  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
    申请人:Tokyo Ohka Kogyo Co., Ltd.
    公开号:US20140178821A1
    公开(公告)日:2014-06-26
    A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R 1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y 1 represents a single bond or a divalent linking group; R 2 and R 3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R 2 and R 3 may form a ring with Y 1 ; M m+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
  • US9040224B2
    申请人:——
    公开号:US9040224B2
    公开(公告)日:2015-05-26
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