(6,6,6-Trifluoro-5-hydroxy-2,2,5-trimethylhexan-3-yl) 2-methylprop-2-enoate

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (6,6,6-Trifluoro-5-hydroxy-2,2,5-trimethylhexan-3-yl) 2-methylprop-2-enoate
• 英文别名: (6,6,6-trifluoro-5-hydroxy-2,2,5-trimethylhexan-3-yl) 2-methylprop-2-enoate
• 化学式: C₁₃H₂₁F₃O₃
• 分子量: 282.3
• InChiKey: CKUNDTWLVHTUDE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  19
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.77
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  6

文献信息

• Topcoat compositions and pattern-forming methods
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US10042259B2

  公开（公告）日：2018-08-07

  Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.

  面漆组合物包括：基质聚合物；表面活性聚合物，该聚合物由以下通式 (I) 的单体聚合而成： 其中R1 代表 H、F、甲基或氟化甲基； R2 代表任选取代的 C1 至 C8 亚烷基或任选取代的 C1 至 C8 氟亚烷基，任选包含一个或多个杂原子； R3 代表 H、F、任选取代的 C1 至 C10 烷基或任选取代的 C5 至 C15 芳基，任选包含一个或多个杂原子；R4 代表任选取代的 C1 至 C8 烷基、任选取代的 C1 至 C8 氟烷基或任选取代的 C5 至 C15 芳基，任选包含一个或多个杂原子；X 代表 O、S 或 NR5，其中 R5 选自氢和任选取代的 C1 至 C5 烷基；a 为 0 或 1；以及溶剂。本发明还提供了涂层基底和图案形成方法，这些基底和方法都使用了本发明的面漆组合物。本发明特别适用于光刻工艺，作为制造半导体器件的光刻胶面涂层。
• TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20180118970A1

  公开（公告）日：2018-05-03

  Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R 1 represents H, F, methyl or fluorinated methyl; R 2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R 3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R 4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR 5 , wherein R 5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.
• TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20180118968A1

  公开（公告）日：2018-05-03

  Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.