1-Ethyl-1-(3-methylbuta-1,3-dien-2-yloxy)cyclopentane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Ethyl-1-(3-methylbuta-1,3-dien-2-yloxy)cyclopentane
• 英文别名: 1-ethyl-1-(3-methylbuta-1,3-dien-2-yloxy)cyclopentane
• 化学式: C₁₂H₂₀O
• 分子量: 180.29
• InChiKey: FQNWKBONOBAPIS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• ARYL ACETATE ONIUM MATERIALS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20150093709A1

  公开（公告）日：2015-04-02

  Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

  提供了一种包括至少一个乙酸基取代的环状芳基或杂环芳基的酸发生剂。这些酸发生剂在光刻胶组分中特别有用。
• PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING THE SAME, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20210011378A1

  公开（公告）日：2021-01-14

  A photosensitive resin composition including an ethylenically unsaturated compound, a resin having a polarity that increases by the action of an acid, and metal atoms, in which a total content of the metal atoms is from 1 ppt to 30 ppb with respect to a total mass of the photosensitive resin composition, and a content of the ethylenically unsaturated compound is from 0.0001% by mass to 1% by mass with respect to the total mass of the photosensitive resin composition, and a method for producing the same; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the photosensitive resin composition.
• US9304394B2
  申请人：——

  公开号：US9304394B2

  公开（公告）日：2016-04-05