4,5-Difluoro-2,2,4-trimethyl-5-(2-methylbutan-2-yl)-1,3-dioxolane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4,5-Difluoro-2,2,4-trimethyl-5-(2-methylbutan-2-yl)-1,3-dioxolane
• 英文别名: 4,5-difluoro-2,2,4-trimethyl-5-(2-methylbutan-2-yl)-1,3-dioxolane
• 化学式: C₁₁H₂₀F₂O₂
• 分子量: 222.27
• InChiKey: HSOGDBXITGWEQM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140212814A1

  公开（公告）日：2014-07-31

  Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.