申请人:ADEKA CORPORATION
公开号:US10150789B2
公开(公告)日:2018-12-11
In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound.
(In the formula, R1 though R10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R11 represents a linear or branched alkyl group having 1 to 8 carbon atoms).
在本发明的薄膜生产方法中,包括在基底上引入蒸汽,该蒸汽是通过汽化包括由下式(I)表示的亚钼化合物在内的薄膜形成材料而获得的,其中包括亚钼化合物;然后通过分解和/或化学反应亚钼化合物,在基底上形成包括钼的薄膜。
(式中,R1 和 R10 分别代表氢原子或具有 1 至 5 个碳原子的直链或支链烷基,R11 代表具有 1 至 8 个碳原子的直链或支链烷基)。