SILANE COMPOUND INCLUDING FLUORINE-CONTAINING POLY(ETHER) GROUP, COMPOSITION INCLUDING THE SAME, FILM FORMED FROM THE COMPOSITION, DISPLAY DEVICE, AND ARTICLE
申请人:Samsung Electronics Co., Ltd.
公开号:US20210054149A1
公开(公告)日:2021-02-25
Disclosed are a composition containing a silane compound including a fluorine-containing poly(ether) group, the silane compound being represented by Formula 1, a film formed from the composition, a display device including the film, and an article including the composition,
Rf-(L
1
)
p1
-Q1-(L
2
)
p2
-Si(R
1
)(R
2
)-(L
3
)
p3
-Si(R
3
)(R
4
)(R
5
) Formula 1
wherein, in Formula 1, Rf is a fluorine-containing poly(ether) group, and Q1, L
1
to L
5
, R
1
to R
5
, R
9
to R
13
, and p1 to p5 are as defined in the specification.
A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.