2-[4,4,4-Trifluoro-3-hydroxy-3-(trifluoromethyl)butoxymethyl]acrylic acid ethyl ester

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-[4,4,4-Trifluoro-3-hydroxy-3-(trifluoromethyl)butoxymethyl]acrylic acid ethyl ester
• 英文别名: ethyl 2-[[4,4,4-trifluoro-3-hydroxy-3-(trifluoromethyl)butoxy]methyl]prop-2-enoate
• 化学式: C₁₁H₁₄F₆O₄
• 分子量: 324.22
• InChiKey: OCHWAGWZLAWYIO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  21
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  55.8
• 氢给体数：
  1
• 氢受体数：
  10

文献信息

• RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER
  申请人：JSR CORPORATION

  公开号：US20160185999A1

  公开（公告）日：2016-06-30

  A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R 1 to R 4 has the fluorine atom or a group including the fluorine atom. R 5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).

  一种树脂组合物，包括聚合物和溶剂。该聚合物包括一个结构单元，该结构单元包括由公式（1）表示的基团，其中在公式（1）中，R1至R4分别独立地表示氢原子、氟原子或具有1至20个碳原子的单价有机基团，其中至少有一个R1至R4包括氟原子或包括氟原子的基团。R5表示具有1至7个碳原子的取代或未取代的三价链烃基团。*表示与结构单元的其他部分结合的位点。该结构单元最好由公式（2-1）至（2-3）中的任何一个表示。在公式（2-1）至（2-3）中，Z表示由公式（1）表示的基团。
• Cleaning composition for semiconductor substrate and cleaning method
  申请人：JSR CORPORATION

  公开号：US10023827B2

  公开（公告）日：2018-07-17

  A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which is a non-polymeric acid. The organic acid is preferably a polyhydric carboxylic acid. The acid dissociation constant of the polymer is preferably less than that of the organic acid. The solubility of the organic acid in water at 25° C. is preferably no less than 5% by mass. The organic acid is preferably a solid at 25° C.

  一种用于半导体基底的清洁组合物含有溶剂和聚合物，聚合物包括氟原子、硅原子或它们的组合。溶剂中水的含量最好不超过 20%（质量百分比）。清洗组合物最好还含有一种非聚合酸的有机酸。有机酸最好是多氢羧酸。聚合物的酸解离常数最好小于有机酸的酸解离常数。有机酸在 25 摄氏度的水中的溶解度最好不低于 5%（质量分数）。有机酸在 25 摄氏度时最好是固体。
• Resin composition, resist pattern-forming method and polymer
  申请人：JSR CORPORATION

  公开号：US10331031B2

  公开（公告）日：2019-06-25

  A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 has the fluorine atom or a group including the fluorine atom. R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).

  一种树脂组合物包括由结构单元组成的聚合物，结构单元包括由式（1）表示的基团和溶剂。在式 (1) 中，R1 至 R4 各自独立地代表氢原子、氟原子或具有 1 至 20 个碳原子的单价有机基团，其中 R1 至 R4 中至少有一个具有氟原子或包括氟原子的基团。R5 代表具有 1 至 7 个碳原子的取代或未取代的三价链烃基。* 表示与结构单元其他分子的结合位点。结构单元最好由式（2-1）至（2-3）中的任意一个表示。在式（2-1）至（2-3）中，Z 代表由式（1）表示的基团。
• Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer
  申请人：JSR CORPORATION

  公开号：US11340528B2

  公开（公告）日：2022-05-24

  Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.

  本文公开了一种用于生产抗蚀剂面漆层组合物的方法，该方法包括：在聚合引发剂存在下，聚合含有含氟单体的单体溶液，聚合引发剂裂解生成总共具有 7 个或更多碳原子的活性物种，从而获得含氟树脂 A；以及混合含氟树脂 A 和溶剂。
• COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER
  申请人：JSR CORPORATION

  公开号：US20140248563A1

  公开（公告）日：2014-09-04

  A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R 1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R 2 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R 3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R Q represents a perfluoroalkyl group having 1 to 5 carbon atoms. R X represents a hydrogen atom or a monovalent base-labile group.