[5,5,5-Trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-yl] 2-[[4,4,4-trifluoro-3-hydroxy-3-(trifluoromethyl)butoxy]methyl]prop-2-enoate

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: [5,5,5-Trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-yl] 2-[[4,4,4-trifluoro-3-hydroxy-3-(trifluoromethyl)butoxy]methyl]prop-2-enoate
• 英文别名: [5,5,5-trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-yl] 2-[[4,4,4-trifluoro-3-hydroxy-3-(trifluoromethyl)butoxy]methyl]prop-2-enoate
• 化学式: C₁₅H₁₆F₁₂O₅
• 分子量: 504.26
• InChiKey: MJFMNBPCGJMGFB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  32
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  76
• 氢给体数：
  2
• 氢受体数：
  17

文献信息

• Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer
  申请人：JSR CORPORATION

  公开号：US11340528B2

  公开（公告）日：2022-05-24

  Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.

  本文公开了一种用于生产抗蚀剂面漆层组合物的方法，该方法包括：在聚合引发剂存在下，聚合含有含氟单体的单体溶液，聚合引发剂裂解生成总共具有 7 个或更多碳原子的活性物种，从而获得含氟树脂 A；以及混合含氟树脂 A 和溶剂。
• COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER
  申请人：JSR CORPORATION

  公开号：US20140248563A1

  公开（公告）日：2014-09-04

  A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R 1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R 2 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R 3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R Q represents a perfluoroalkyl group having 1 to 5 carbon atoms. R X represents a hydrogen atom or a monovalent base-labile group.
• PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD OF FORMING RESIST PATTERN, PRODUCTION METHOD OF FLUORINE-CONTAINING RESIN, AND METHOD OF IMPROVING WATER REPELLENCY OF RESIST TOP COAT LAYER
  申请人：JSR CORPORATION

  公开号：US20210181630A1

  公开（公告）日：2021-06-17

  Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.
• US9268225B2
  申请人：——

  公开号：US9268225B2

  公开（公告）日：2016-02-23