1-Ethoxy-3,3-difluorobutane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Ethoxy-3,3-difluorobutane
• 英文别名: 1-ethoxy-3,3-difluorobutane
• 化学式: C₆H₁₂F₂O
• 分子量: 138.16
• InChiKey: DHVWFWQKWVHGAP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160244400A1

  公开（公告）日：2016-08-25

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L 1 represents a C1-C8 fluorinated alkanediyl group, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L 1 , and R 2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.

  化合物的化学式（I）表示如下： 其中，R1代表氢原子、卤素原子或C1-C6烷基，其中氢原子可以被卤素原子取代，L1代表C1-C8氟代烷二基基团，X1代表*—CO—O—、*—O—CO—、*—O—CO—O—或*—O—，其中*代表与L1结合位点，R2代表C1-C18烃基团，其中亚甲基基团可以被氧原子、羰基团或磺酰基团取代，其中氢原子可以被羟基取代，或其中两个氢原子可以分别被氧原子取代，与氧原子结合形成一个与氧原子结合的C1-C8烷二基基团一起形成一个缩醛结构，所述缩醛结构中的氢原子可以被氟原子取代。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170247323A1

  公开（公告）日：2017-08-31

  A salt having a group represented by the formula (aa): wherein X a and X b independently each represent an oxygen atom or a sulfur atom, the ring W represents a C3-C36 heterocyclic ring which has an ester bond or a thioester bond, said heterocyclic ring optionally further having an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group each by which a methylene group has been replaced, and said heterocycilic ring optionally having a hydroxyl group, a cyano group, a carboxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C2-C13 alkoxycarbonyl group, a C2-C13 acyl group, a C2-C13 acyloxy group, a C3-C12 alicyclic hydrocarbon group, a C6-C10 aromatic hydrocarbon group or any combination of these groups each by which a hydrogen atom has been replaced, and * represents a binding position.

  一种盐，其具有由公式（aa）表示的基团：其中Xa和Xb独立地代表一个氧原子或一个硫原子，环W代表一个具有酯键或硫酯键的C3-C36杂环环，该杂环环还可以进一步具有一个氧原子、一个硫原子、一个羰基或一个磺酰基，其中每个都已被一个亚甲基取代，该杂环环还可以具有一个羟基、一个氰基、一个羧基、一个C1-C12烷基、一个C1-C12烷氧基、一个C2-C13烷氧羰基、一个C2-C13酰基、一个C2-C13酰氧基、一个C3-C12脂环烃基、一个C6-C10芳香烃基或任何组合，其中每个都已被氢原子取代，*表示一个结合位置。
• Photoresist composition and process for producing photoresist pattern
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US11327399B2

  公开（公告）日：2022-05-10

  A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):

  一种光刻胶组合物，包括 由式 (I) 所代表的结构单元组成的树脂： 和式 (B1) 所代表的盐：
• PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20150241769A1

  公开（公告）日：2015-08-27

  A photoresist composition comprising a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0).
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160077432A1

  公开（公告）日：2016-03-17

  A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. In the formula (a4), R 3 represents a hydrogen atom or a methyl group, and R 4 represents a C 1 to C 24 saturated hydrocarbon group having a fluorine atom, and a methylene group of the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group,