1-Ethoxy-3,3-difluoropentane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Ethoxy-3,3-difluoropentane
• 英文别名: 1-ethoxy-3,3-difluoropentane
• 化学式: C₇H₁₄F₂O
• 分子量: 152.18
• InChiKey: ABYCPDZXFPKMEK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20190137873A1

  公开（公告）日：2019-05-09

  The present invention can provide a salt and a resist composition including the salt, capable of producing a resist pattern with satisfactory line edge roughness (LER). A salt represented by formula (I): wherein R 1 and R 2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R 1 and R 2 are bonded each other to form a ring together with sulfur atoms to which they are bonded, R 3 , R 4 and R 5 each independently represent a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 12 carbon atoms, —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—, and A − represents a counter anion.

  本发明提供了一种盐和包括该盐的抗蚀剂组合物，能够产生具有令人满意的线边粗糙度（LER）的抗蚀图案。该盐由式（I）表示：其中R1和R2各代表可能具有取代基的链烃基，可能具有取代基的脂环烃基或可能具有取代基的芳香烃基，或者R1和R2彼此相连以形成与它们结合的硫原子一起的环，R3、R4和R5各自独立地表示氢原子、氟原子或具有1至12个碳原子的烃基，烃基中包括的—CH2—可以被—O—或—CO—所取代，A-表示反离子。
• SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20200159116A1

  公开（公告）日：2020-05-21

  A salt is represented by formula (I). In formula (I), R 1 , R 2 and R 3 each independently represent a halogen atom, a perfluoroalkyl group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—, m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of R 1 may be the same or different from each other, m2 represents an integer of 0 to 4, and when m2 is 2 or more, a plurality of R 2 may be the same or different from each other, and m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of R 3 may be the same or different from each other.

  盐由化学式（I）表示。在化学式（I）中，R1、R2和R3分别代表卤素原子、具有1至6个碳原子的全氟烷基基团或具有1至12个碳原子的碳氢基团，而包含在碳氢基团中的—CH2—可以被—O—或—CO—替代，m1表示0至4的整数，当m1为2或更多时，多个R1可能相同或不同，m2表示0至4的整数，当m2为2或更多时，多个R2可能相同或不同，m3表示0至4的整数，当m3为2或更多时，多个R3可能相同或不同。
• SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING SALT
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20200385343A1

  公开（公告）日：2020-12-10

  Disclosed are a salt represented by formula (1), and a method for producing the salt, and a quencher and a resist composition comprising the same: wherein R 1 and R 2 each represent a hydrocarbon group, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—; R 3 , R 4 and R 5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R 3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R 4 and/or a plurality of R 5 may be the same or different from each other.

  揭示了一种由化学式（1）表示的盐，以及生产该盐的方法，以及包括该盐的熄灭剂和抗蚀组合物：其中R1和R2分别代表一个碳氢基团，碳氢基团中包含的—CH2—可以被—O—或—CO—替代；R3、R4和R5分别代表卤素原子、烷基氟基团或碳氢基团，碳氢基团中包含的— —可以被—O—或—CO—替代；m3表示0到2的整数，当m3为2时，两个R3可能相同也可能不同；m4和m5表示0到5的整数，当m4和/或m5为2或更多时，多个R4和/或多个R5可能相同也可能不同。
• RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210286261A1

  公开（公告）日：2021-09-16

  Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):

  揭示了一种耐受组合物，包括由式（I）表示的化合物、具有酸敏基团和酸发生剂的树脂，其中具有酸敏基团的树脂包括至少从以下组中选择的一种：由式（a1-1）表示的结构单元和由式（a1-2）表示的结构单元。
• CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371377A1

  公开（公告）日：2021-12-02

  A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R 1 , R 2 and R 3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X 1 represents a single bond, —CH 2 —, —O—, —S—, —CO—, —SO— or —SO 2 —.

  一种以式(I)表示的羧酸盐、淬灭剂和包括该羧酸盐的抗蚀组合物：其中，R1、R2和R3分别表示卤素原子、氟代烷基或烃基，该烃基可以有取代基，烃基中包括的—CH2—可以被—O—、—CO—、—S—或—SO2—替换，m1表示0到5的整数，m2表示0到4的整数，m3表示0到3的整数，X1表示单键、— —、—O—、—S—、—CO—、—SO—或—SO2—。