Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition
Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition
PREPOLYMER, CURABLE MATERIAL, COATING COMPOSITION, NON-LINEAR OPTICAL MATERIAL, OPTICAL WAVEGUIDE AND LIGHT CONTROL DEVICE
申请人:Asahi Glass Company, Limited
公开号:EP2889684A1
公开(公告)日:2015-07-01
Provided are: a prepolymer which is capable of forming a non-linear optical material that has excellent non-linear optical effect, heat resistance, withstand voltage and transparency; a curable material which contains the prepolymer; a coating composition which contains the curable material and a solvent; a non-linear optical material which is obtained by curing the curable material; an optical waveguide which uses the non-linear optical material; and a light control device which is provided with the optical waveguide. The present invention uses a prepolymer having a crosslinkable functional group, which is obtained by reacting one or more compounds (X) that are selected from the group consisting of compounds (X1), compounds (X2) and compounds (X3), a compound (Y) that is represented by formula (Y), a compound (Z) that has three or more phenolic hydroxyl groups, and an organic compound (B) that exerts a non-linear optical effect and has a reactive group.
Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition
申请人:NEC Corporation
公开号:US06746722B2
公开(公告)日:2004-06-08
A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.