Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition
申请人:NEC Corporation
公开号:US06746722B2
公开(公告)日:2004-06-08
A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.
一种具有特定结构的含氟苯基马来酰亚胺衍生物。通过聚合含有该衍生物的单体得到的聚合物。该聚合物含有特定的结构单元,其重均分子量为2,000至200,000。一种化学放大型光刻胶组合物,包含上述聚合物和光酸发生剂,其中聚合物相对于总聚合物和光酸发生剂的质量比为70至99.8%。一种图形形成方法,包括在待加工基板上涂覆上述组合物,使用180纳米或更短波长的光进行曝光,然后进行烘烤和显影。