7,7,7-trifluoro-3-ethyl-3-heptyl methacrylate | 1022162-55-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 7,7,7-trifluoro-3-ethyl-3-heptyl methacrylate
• 英文别名: (3-Ethyl-7,7,7-trifluoroheptan-3-yl) 2-methylprop-2-enoate
• CAS: 1022162-55-5
• 化学式: C₁₃H₂₁F₃O₂
• 分子量: 266.304
• InChiKey: YDVJFKYXCDCGIQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.9
• 重原子数：
  18
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.77
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  1-溴-4,4,4-三氟丁烷 、 3-戊酮 在 magnesium 作用下， 以 四氢呋喃 为溶剂， 生成 7,7,7-trifluoro-3-ethyl-3-heptyl methacrylate
  参考文献：
  名称：

  RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER

  摘要：

  一种辐射敏感树脂组合物包括第一聚合物，其中包括具有酸敏感基团的重复单元，在酸敏感基团解离后变为碱溶解性，并且包括辐射敏感酸发生剂。酸敏感基团具有通式（1）所示的结构。R1代表甲基基团或类似物，R2代表形成环状结构的碳氢基团，R3代表氟原子或类似物，R4代表碳原子，n1为1至7之间的整数。

  公开号：

  US20120156612A1

文献信息

• COMPOUND AND POLYMERIC COMPOUND
  申请人：Utsumi Yoshiyuki

  公开号：US20100069590A1

  公开（公告）日：2010-03-18

  A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R 1 to R 3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R 1 to R 3 are bonded, and at least one of R 1 to R 3 represents a fluorinated alkyl group; and R 2 and R 3 may form a ring structure.

  化合物的通式(I)表示的是一个化合物；以及包括结构单元(a1)的聚合物，该结构单元的通式(II)表示。其中，R代表氢原子、卤素原子、低碳基或卤代低碳基；R1至R3各自独立地表示碳基或氟化碳基，但需注意的是，氟原子不与R1至R3中的三级碳原子相邻的碳原子相结合，且R1至R3中至少有一个表示氟化碳基；而且R2和R3可以形成一个环状结构。
• Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
  申请人：Takeshita Masaru

  公开号：US20100143844A1

  公开（公告）日：2010-06-10

  A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

  一种用于浸泡曝光的抗蚀组合物，包括：基础组分（A），在酸作用下在碱性显影液中表现出改变的溶解度；酸发生器组分（B），在曝光时生成酸；和含氟树脂组分（F）；溶解于有机溶剂（S）中，含氟树脂组分（F）包括一个含有氟原子的结构单元（f1），一个含有亲水基团的脂肪烃基团的结构单元（f2），以及来自丙烯酸酯的结构单元（f3），其中该丙烯酸酯含有三级烷基基团或烷氧基烷基团。
• RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING RESIN
  申请人：TAKESHITA Masaru

  公开号：US20120116038A1

  公开（公告）日：2012-05-10

  A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

  一种浸泡曝光用的抗蚀组合物，包括：基础组分（A），在酸的作用下在碱性显影液中表现出改变的溶解度；酸发生器组分（B），在曝光时生成酸；以及含氟树脂组分（F），溶解于有机溶剂（S）中，含氟树脂组分（F）包括一个含有氟原子的结构单元（f1），一个含有亲水基的脂肪烃基的结构单元（f2），以及源自丙烯酸酯的一个三级烷基含有基团或烷氧基烷基含有基团的结构单元（f3）。
• FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPOSURE, AND METHOD OF FORMING RESIST PATTERN
  申请人：Furuya Sanae

  公开号：US20090047602A1

  公开（公告）日：2009-02-19

  A resist composition for immersion exposure including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon irradiation, and a fluorine-containing compound (C) having a group represented by general formula (c) shown below and containing at least one fluorine atom: wherein Q represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group; and R 1 represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom.

  一种用于浸没曝光的抗蚀组合物，包括基础组分（A），在酸作用下在碱性显影液中表现出改变的溶解度，酸发生剂组分（B），在辐照下生成酸，以及含有至少一个氟原子的通式（c）所表示的基团的含氟化合物（C）：其中Q表示从一价亲水基团中去除了一个氢原子的基团; R1表示一个含有2个或更多碳原子的碳氢基团，可能具有氟原子。
• RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER
  申请人：Furuya Sanae

  公开号：US20090186300A1

  公开（公告）日：2009-07-23

  A resist composition for immersion exposure including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing copolymer (C) containing a structural unit (c1) represented by general formula (c1-1) shown below. In the formula, R 1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group, Q 1 represents a single bond or a divalent linking group, A represents an aromatic cyclic group that may have a substituent, Q 2 represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group, R 2 represents a base dissociable group, and a represents 1 or 2, provided that at least one among A and the a R 2 groups contains a fluorine atom.