申请人:Fang Fu-Chuan
公开号:US20130177759A1
公开(公告)日:2013-07-11
A coating composition is provided. The coating composition comprises (a) an aluminum oxide precursor and (b) a solvent, wherein the aluminum oxide precursor (a) comprises aluminum elements and the following groups bound thereon:
(a1) a —OR
1
group, wherein R
1
is H or a substituted or unsubstituted C1 to C13 alkyl;
(a2) a bidentate chelating group; and
(a3) a tetrahedral coordinating group,
wherein, the amount of the aluminum oxide precursor (a) is about 1 wt % to about 50 wt %, based on the total weight of the composition, and the total amount of the groups (a1), (a2) and (a3) is no more than 3 moles per 1 mole of the aluminum elements. The coating composition can be used in a semiconductor process for providing a passivation layer.