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1-Benzyl-4-benzoylpyridinium-Kation | 149757-56-2

中文名称
——
中文别名
——
英文名称
1-Benzyl-4-benzoylpyridinium-Kation
英文别名
4-Benzoyl-1-benzylpyridinium;Bz-BP;1-Benzyl-4-(phenylcarbonyl)pyridinium;(1-benzylpyridin-1-ium-4-yl)-phenylmethanone
1-Benzyl-4-benzoylpyridinium-Kation化学式
CAS
149757-56-2
化学式
C19H16NO
mdl
——
分子量
274.342
InChiKey
GYWDTHHPXIBOJK-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.9
  • 重原子数:
    21
  • 可旋转键数:
    4
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.05
  • 拓扑面积:
    21
  • 氢给体数:
    0
  • 氢受体数:
    1

反应信息

  • 作为反应物:
    描述:
    参考文献:
    名称:
    Simultaneous Electron Transfer from Free and Intercalated 4-Benzoylpyridinium Cations in Cucurbit[7]uril
    摘要:
    N-Substituted 4-benzoylpyridinium monocations form stable host-guest complexes with cucurbit[7]uril (CB[71) in DMSO (K-eq approximate to 0.6-1.9 x 10(3) M-1). Observation of simultaneous reversible and quasi-reversible e-transfer processes from the free and intercalated quests, respectively, is attributed to the pre-e-transfer host-guest equilibrium. The standard rate constant for Me-BP@CB[7] (k(s) = 1.0 x 10(-4) cm-s(-1)) reflects e-transfer across 5.7 angstrom, corresponding to the distance of the intercalated guest from the outmost perimeter of CB[7] (5.3 angstrom).
    DOI:
    10.1021/ol9002459
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文献信息

  • PHOTO LEWIS ACID GENERATOR
    申请人:Nippon Shokubai Co., Ltd.
    公开号:US20200062783A1
    公开(公告)日:2020-02-27
    Provided is a compound capable of generating a Lewis acid in response to light unlike conventional photo acid generators. The compound comprises an anionic moiety having a central boron atom and a particular cationic moiety (for example, a cation having a HOMO-LUMO gap of 5.3 eV or less). The cationic moiety may, for example, have a skeleton selected from an N-substituted pyridinium skeleton, an N-substituted bipyridinium skeleton, an N-substituted quinolinium skeleton, and a pyrylium skeleton.
    提供一种化合物,能够产生与传统光酸发生器不同的路易斯酸。该化合物包括具有中心原子的阴离子基团和特定阳离子基团(例如,具有5.3电子伏特或更低的HOMO-LUMO能隙的阳离子基团)。阳离子基团可以选择具有N-取代吡啶骨架、N-取代联吡啶骨架、N-取代喹啉骨架和吡啉骨架的骨架之一。
  • [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIFS AU MOYEN DE LA COMPOSITION
    申请人:FUJIFILM CORP
    公开号:WO2010035905A1
    公开(公告)日:2010-04-01
    An actinic ray-sensitive or radiation-sensitive resin composition comprising any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)?2- and OS(=O)2-, provided that -C(=O)O- is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
    一种光化学射线敏感性或辐射敏感性树脂组合物,包括下面的通式(I)中的任何一种化合物;其中:Ar代表可能具有除了-(A-B)基团之外的取代基的芳香环;n为大于等于1的整数;A代表从单键、烷基基团、-O-、-S-、-C(=O)-、-S(=O)-、-S(=O)2-和OS(=O)2-中选取的任意一个或两个以上成员的组合,但不包括-C(=O)O-;B代表含有4个或更多碳原子的烃基团的基团,当n大于等于2时,两个或更多个-(A-B)基团可以相同或不同;M+代表有机离子。
  • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION
    申请人:TSUCHIMURA Tomotaka
    公开号:US20110171577A1
    公开(公告)日:2011-07-14
    An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O) 2 — and —OS(═O) 2 —, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M + represents an organic onium ion.
    一种感光射线敏感或辐射敏感的树脂组合物包括下列通式(I)中的任何一种化合物;其中:Ar代表可能具有除了-(A-B)基团以外的取代基的芳香环;n是大于等于1的整数;A代表从单键、烷基、—O—、—S—、—C(═O)—、—S(═O)—、—S(═O)2—和—OS(═O)2—中任意选择一个或两个或两个以上成员的组合,但不包括—C(═O)O—;B代表一个含有4个或更多碳原子的烃基团,其中包含一个三级或季级碳原子,当n大于等于2时,两个或两个以上的-(A-B)基团可以相同或不同;M+代表有机阳离子。
  • Ink composition comprising an onium salt and a cationically polymerisable compound, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
    申请人:Fuji Photo Film Co., Ltd.
    公开号:EP1754758A2
    公开(公告)日:2007-02-21
    An ink composition is provided that includes (a) an onium salt, a counteranion thereof having a volume of 1,000 Å3 or greater and (b) a cationically polymerizable compound. There is also provided an inkjet recording method that includes (a') a step of discharging the ink composition onto a recording medium and (b') a step of curing the ink composition by irradiating the discharged ink composition with actinic radiation. There are also provided a printed material obtained by the inkjet recording method, a process for producing a lithographic printing plate employing the ink composition, and a lithographic printing plate obtained by the production process.
    提供了一种墨组合物,其中包括(a)鎓盐,其反离子的体积为 1,000 Å3 或更大,以及(b)阳离子可聚合化合物。还提供了一种喷墨记录方法,包括(a')将墨组合物排放到记录介质上的步骤和(b')通过用阳极辐射照射排放的墨组合物来固化墨组合物的步骤。此外,还提供了通过喷墨记录方法获得的印刷材料、使用该墨组合物生产平版印刷板的工艺,以及通过该生产工艺获得的平版印刷板。
  • Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film
    申请人:Ichimura Kunihiro
    公开号:US20050227166A1
    公开(公告)日:2005-10-13
    An activation energy ray-sensitive composition permitting development with neutral water. Provided is an activation energy ray-sensitive composition characterized by comprising a dispersion which comprises an aqueous solution of a water-soluble resin, and an acid former dispersed in the aqueous solution in the form of fine powder, the acid former being insoluble or sparingly soluble in water and generating an acid by the action of activation energy rays, and an acid-reactive insolubilizing agent dissolved or dispersed in the dispersion and insolubilizing the water-soluble resin by the action of the acid.
    一种可使用中性显影的活化能射线敏感组合物。本发明提供了一种对活化能射线敏感的组合物,其特征在于该组合物包含一种分散体,分散体由溶性树脂溶液和以细粉形式分散在溶液中的酸前体组成,酸前体不溶于或极少溶于,并在活化能射线的作用下产生一种酸;以及一种酸反应型不溶解剂,溶解或分散在分散体中,并在酸的作用下不溶解溶性树脂
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