Compositions and processes for immersion lithography
申请人:Rohm and Haas Electronic Materials LLC
公开号:US10222699B2
公开(公告)日:2019-03-05
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
METHOD OF MANUFACTURING POLYMER FOR LITHOGRAPHY, METHOD OF MANUFACTURING RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE HAVING PATTERN
申请人:Mitsubishi Rayon Co., Ltd.
公开号:US20150044608A1
公开(公告)日:2015-02-12
[Object]
Provided is a method of manufacturing a polymer for lithography having reduced residual amounts of un-reacted monomers and a poor solvent used for a purification process.
[Solving Means]
The method of manufacturing a polymer for lithography includes a polymerization process of obtaining a polymerization reaction solution including a polymer by polymerizing monomers in the presence of a polymerization solvent, and a purification process of obtaining a wet powder of a purified polymer by purifying the polymer in the polymerization reaction solution using a re-precipitation method, in which the purification process includes a process of filtering at a filtration differential pressure of 50 kPa or more, and the solid content of the wet powder of the purified polymer exceeds 40% by mass and is less than 65% by mass.
US9223213B2
申请人:——
公开号:US9223213B2
公开(公告)日:2015-12-29
[EN] METHOD FOR RECYCLING NITRILE RUBBER<br/>[FR] PROCÉDÉ DE RECYCLAGE DE CAOUTCHOUC NITRILE<br/>[JA] ニトリルゴムの回収方法