hexafluoro-1,2-naphthalyne | 73501-12-9

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 芳基卤化物
• 英文名称: hexafluoro-1,2-naphthalyne
• 英文别名: Hexafluor-1,2-naphthalyn；Hexafluoro-1,2-didehydronaphthalene
• CAS: 73501-12-9
• 化学式: C₁₀F₆
• 分子量: 234.1
• InChiKey: JESNBKFUBJTXTQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  16
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  hexafluoro-1,2-naphthalyne 、 呋喃 生成 1,4-epoxy-5,6,7,8,9,10-hexafluoro-1,4-dihydrophenanthrene
  参考文献：
  名称：

  BURDON J.; GILL H. S.; PARSONS I. W.; TATLOW J. COLIN, J. CHEM. SOC. CHEM. COMMUN., 1979, NO 24, 1147-1148

  摘要：

  DOI：
• 作为产物：
  描述：

  β-perfluoronaphthyllithium 生成 hexafluoro-1,2-naphthalyne
  参考文献：
  名称：

  多环氟芳族化合物。第11部分[1]。六氟1,2-萘

  摘要：

  七氟-2-萘基锂分解得到六氟1,2-萘，而不是2,3-化合物。用呋喃和七氟-2-萘基锂捕获芳烃证明了这一点。在最后一个反应中，萘2位与1位的进攻比率为9：2。

  DOI：

  10.1016/s0022-1139(00)85209-4

文献信息

• Fluorine Radiolabelling Process
  申请人：Gouveneur Veronique

  公开号：US20130190529A1

  公开（公告）日：2013-07-25

  The invention relates to a process for producing a process for producing an 18 F-labelled compound, the process comprising treating a compound of formula (I) wherein EDG is an electron-donating group selected from —OH, —OR 4 , —NHR 5 and —NR 55 R 5 ; R 1 , R 2 , X 1 and X 2 are as defined herein; and R 3 is selected from H, X 3 and X 4 , wherein X 3 is a monodentate cleavable surrogate group, and X 4 is a bidentate cleavable surrogate group which is bonded (a) to said X 1 or X 2 and (b) to the ring carbon atom para to EDG; with [ 18 F]fluoride in the presence of an oxidant, thereby producing, when R 3 in the compound of formula (I) is H, an 18 F-labelled compound of formula (II), wherein EDG is as defined above and R 1 , R 2 , X 1 and X 2 are as defined herein; or thereby producing, when R 3 in the compound of formula (I) is said monodentate cleavable surrogate group X 3 , a compound of formula (IIa), wherein EDG′ is O, NR 5 , —NR 55 R 5 or [OR 4 ] + , and wherein R 4 , R 5 , R 55 , R 1 , R 2 , X 1 , X 2 and X 3 are as defined herein; or thereby producing, when R 3 in the compound of formula (I) is said bidentate cleavable surrogate group X 4 , a compound of formula (IIc) or a compound of formula (IId), wherein EDG′ is O, NR 5 , —NR 55 R 5 or [OR 4 ] + , and wherein R 4 , R 5 , R 55 , R 1 , R 2 , X 1 , X 2 and X 4 are as defined herein

  该发明涉及一种用于制备18F标记化合物的过程，该过程包括处理以下结构的化合物（I）：其中EDG是从—OH、—OR4、—NHR5和—NR55R5中选择的电子给体基团；R1、R2、X1和X2如本文所定义；以及R3从H、X3和X4中选择，其中X3是一种可单齿解离替代基团，而X4是一种双齿可解离替代基团，它与EDG对位的环碳原子上键合（a）到所述的X1或X2，（b）到EDG的对位环碳原子；在氧化剂存在下用[18F]氟化物处理，从而产生当化合物（I）中的R3为H时，化合物（II）的18F标记化合物，其中EDG如上所定义，而R1、R2、X1和X2如本文所定义；或者从而产生当化合物（I）中的R3为所述的可单齿解离替代基团X3时，化合物（IIa），其中EDG'为O、NR5、—NR55R5或[OR4]+，而R4、R5、R55、R1、R2、X1、X2和X3如本文所定义；或者从而产生当化合物（I）中的R3为所述的双齿可解离替代基团X4时，化合物（IIc）或化合物（IId），其中EDG'为O、NR5、—NR55R5或[OR4]+，而R4、R5、R55、R1、R2、X1、X2和X4如本文所定义。
• [EN] PREPARATION OF LABELLED COMPOUNDS<br/>[FR] PRÉPARATION DE COMPOSÉS MARQUÉS
  申请人：ISIS INNOVATION

  公开号：WO2010133851A1

  公开（公告）日：2010-11-25

  The invention relates to a process for producing a labelled compound, which process comprises treating a compound of formula (I), wherein X is a moiety to be labelled or a detectable label, and R1, R2, R3 and R4 are substitutent groups as defined herein; with a compound of formula (II) : N3-L-Y (π) wherein Y is a detectable label or a moiety to be labelled, provided that if X in the compound of formula (I) is a moiety to be labelled, then Y is a detectable label and if X in the compound of formula (I) is a detectable label, then Y is a moiety to be labelled; and L is a bond or a linking group, thereby producing a labelled compound of formula (IH) by Staudinger Ligation. Groups R3 and R4 may comprise fluorous moieties, in order to facilitate purification of the labelled compound of formula (IH). The invention also provides methods of imaging a human or non-human patient or a cell or in vitro sample, using the labelled compound of formula (III) thus produced, as well as imaging methods in which the compounds of formulae (I) and (II) are administered to the patient, cell or sample. The invention further provides novel compounds of formula (I) and formula (III), a process for producing the compounds of formula (T), and a combination product for medical imaging comprising a compound of formula (I) and a compound of formula (II).

  该发明涉及一种用于生产标记化合物的方法，该方法包括处理具有以下结构式（I）的化合物，其中X是待标记的基团或可检测的标记，R1、R2、R3和R4是如本文所定义的取代基团；与具有以下结构式（II）的化合物：N3-L-Y（π），其中Y是可检测的标记或待标记的基团，前提是如果结构式（I）中的X是待标记的基团，则Y是可检测的标记，如果结构式（I）中的X是可检测的标记，则Y是待标记的基团；L是键合或连接基团，从而通过斯陶丁格反应生成具有结构式（IH）的标记化合物。取代基团R3和R4可能包括氟基团，以便促进对具有结构式（IH）的标记化合物的纯化。该发明还提供了使用因此生产的具有结构式（III）的标记化合物对人类或非人类患者、细胞或体外样本进行成像的方法，以及在这些方法中向患者、细胞或样本施用结构式（I）和（II）化合物的成像方法。该发明还提供了具有结构式（I）和结构式（III）的新化合物，以及生产结构式（T）化合物的方法和包含结构式（I）化合物和结构式（II）化合物的医学成像组合产品。
• Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds
  申请人：JSR Corporation

  公开号：EP1142928A1

  公开（公告）日：2001-10-10

  A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

  一种新型聚硅氧烷，具有以下结构单元(I)和/或(II)以及结构单元(III)、 其中 A1 和 A2 是可酸解的一价有机基团，R1 是氢、一价（卤代）烃、卤素或氨基，R2 是一价（卤代）烃基团或卤素。此外，还提供了制备这种聚硅氧烷的方法、提供这种聚硅氧烷的含硅脂环化合物以及包含这种聚硅氧烷的辐射敏感树脂组合物。这种聚硅氧烷可用作抗蚀剂材料的树脂成分，能有效地感知短波长辐射，对辐射具有高透明度和优异的干蚀刻性能，并在抗蚀剂材料所需的基本抗蚀性能（如高灵敏度、分辨率、显影性等）方面表现优异。
• Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition
  申请人：——

  公开号：US20010041769A1

  公开（公告）日：2001-11-15

  A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), 1 wherein A 1 and A 2 are an acid-dissociable monovalent organic group, R 1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R 2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

  一种新型聚硅氧烷，具有以下结构单元(I)和/或(II)以及结构单元(III)、 1 其中 A 1 和 A 2 是可被酸分解的单价有机基团，R 1 是氢、一价（卤代）烃、卤素或氨基，R 2 是一价（卤代）烃基或卤素。此外，还提供了制备这种聚硅氧烷的方法、提供这种聚硅氧烷的含硅脂环化合物以及包含这种聚硅氧烷的辐射敏感树脂组合物。这种聚硅氧烷可用作抗蚀剂材料的树脂成分，能有效地感知短波长辐射，对辐射具有高透明度和优异的干蚀刻性能，并在抗蚀剂材料所需的基本抗蚀性能（如高灵敏度、分辨率、显影性等）方面表现优异。
• Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
  申请人：——

  公开号：US20030191268A1

  公开（公告）日：2003-10-09

  A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), 1 wherein A 1 and A 2 are an acid-dissociable monovalent organic group, R 1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R 2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

  一种新型聚硅氧烷，具有以下结构单元(I)和/或(II)以及结构单元(III)、 1 其中 A 1 和 A 2 是可被酸分解的单价有机基团，R 1 是氢、一价（卤代）烃、卤素或氨基，R 2 是一价（卤代）烃基或卤素。此外，还提供了制备这种聚硅氧烷的方法、提供这种聚硅氧烷的含硅脂环化合物以及包含这种聚硅氧烷的辐射敏感树脂组合物。这种聚硅氧烷可用作抗蚀剂材料的树脂成分，能有效地感知短波长辐射，对辐射具有高透明度和优异的干蚀刻性能，并在抗蚀剂材料所需的基本抗蚀性能（如高灵敏度、分辨率、显影性等）方面表现优异。