1-(4-Fluorophenyl)-2-(thiolan-1-ium-1-yl)ethanone

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(4-Fluorophenyl)-2-(thiolan-1-ium-1-yl)ethanone
• 化学式: C12H14FOS+
• 分子量: 225.3
• InChiKey: GPJIZAJRYPRLEE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  18.1
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140296561A1

  公开（公告）日：2014-10-02

  A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl(meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.

  一种含有4-氟苯基的磺鎵盐被引入到聚合物中，该聚合物包含羟基苯基（甲基）丙烯酸酯单元和含酸性易裂解基团的（甲基）丙烯酸酯单元，形成一种聚合物，可用作抗蚀剂组成中的基础树脂。抗蚀剂组成具有高灵敏度、高分辨率和最小化LER。
• Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2455811B1

  公开（公告）日：2016-01-13
• Resin and Chemically Amplified Resist Composition Comprising the Same
  申请人：TAKEMOTO Ichiki

  公开号：US20100075257A1

  公开（公告）日：2010-03-25

  A resin comprising a structural unit represented by the formula (I): wherein Q 1 and Q 2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH 2 — may be replaced by —O— etc., X 1 represents —O—CO— etc., and A + represents an organic counter ion.
• US8110336B2
  申请人：——

  公开号：US8110336B2

  公开（公告）日：2012-02-07
• US8785105B2
  申请人：——

  公开号：US8785105B2

  公开（公告）日：2014-07-22