1-(4-Methoxyphenyl)-2-(thiolan-1-ium-1-yl)ethanone

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(4-Methoxyphenyl)-2-(thiolan-1-ium-1-yl)ethanone
• 化学式: C13H17O2S+
• 分子量: 237.34
• InChiKey: SCBOKALULPCQKQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  27.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Harada Yukako

  公开号：US20070078269A1

  公开（公告）日：2007-04-05

  The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种具有公式(I)的盐： 其中环Y代表具有3至30个碳原子的单环或多元环烃基团，其中一个—CH2—基团被—COO—基团取代，并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代，具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；A+代表有机反离子；n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304293A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (a): wherein Q 1 and Q 2 each independently represent a fluorine atom etc., X 1 represents a single bond etc., X 2 represents a single bond etc., Y 1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X 2 —Y 1 group has one or more fluorine atoms, and Z + represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  由公式(a)表示的盐：其中Q1和Q2各自独立代表氟原子等，X1代表单键等，X2代表单键等，Y1代表C3-C6的脂环烃基等，但条件是—X2—Y1基团具有一个或多个氟原子，以及Z+代表有机反离子，以及包含由公式(a)表示的盐的光阻剂组合物和包含具有酸不稳定的基团并且在水性碱液中不溶或微溶于但在酸性作用下水性碱液中变得可溶的树脂的结构单元。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Shigematsu Junji

  公开号：US20080086014A1

  公开（公告）日：2008-04-10

  The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH 2 — in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH 2 — in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion.

  本发明提供了一种由公式(I)表示的盐：其中X代表含至少一个二价脂环烃基的C3-C30二价基团，并且C3-C30二价基团中的至少一个—CH2—可以被—O—或—CO—取代，Y代表一个C3-C30环烃基，该环烃基可以至少被选自C1-C6烷氧基、C1-C4全氟烷基、C1-C6羟基烷基、羟基和氰基的至少一个取代基取代，并且C3-C30环烃基中的至少一个— —可以被—O—或—CO—取代，Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基，以及A+代表一个有机反离子。
• Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
  申请人：FUJIFILM CORPORATION

  公开号：US10248019B2

  公开（公告）日：2019-04-02

  A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

  一种形成图案的方法包括：(i) 使用一种含有（A）一种能够在受到光或辐射照射时生成酸并通过酸的作用分解以降低该化合物（A）对有机溶剂的溶解度的光敏或辐射敏感树脂组合物形成薄膜；(ii) 曝光薄膜；和(iii) 使用含有有机溶剂的显影剂进行显影。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200369605A1

  公开（公告）日：2020-11-26

  An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

  提供一种化学式为（1）的铵盐和包括该铵盐作为PAG的化学增感抗蚀组合物。通过光刻加工时，该抗蚀组合物表现出高灵敏度，最小LWR和改善的CDU，无论其为正像还是负像。