1-[1-hydroxy-2,2,2-trifluoro-1-(trifluoromethyl)ethyl]cyclopentyl methacrylate | 944480-13-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-[1-hydroxy-2,2,2-trifluoro-1-(trifluoromethyl)ethyl]cyclopentyl methacrylate
• 英文别名: [1-(1,1,1,3,3,3-Hexafluoro-2-hydroxypropan-2-yl)cyclopentyl] 2-methylprop-2-enoate
• CAS: 944480-13-1
• 化学式: C₁₂H₁₄F₆O₃
• 分子量: 320.232
• InChiKey: SGDSSFWPJARKRG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  1-[1-hydroxy-2,2,2-trifluoro-1-(trifluoromethyl)ethyl]cyclopentanol 、 甲基丙烯酰氯 在 三乙胺 作用下， 以 甲苯 为溶剂， 反应 3.0h， 以80%的产率得到1-[1-hydroxy-2,2,2-trifluoro-1-(trifluoromethyl)ethyl]cyclopentyl methacrylate
  参考文献：
  名称：

  Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process

  摘要：

  通过将化学式（1）的氟化合物与化学式（2）和（3）的还原剂或有机金属试剂反应制备化学式（4）的氟醇化合物，其中R1是H或一价的碳1-碳20烃基，其中任何一个—CH2—基团可能被—O—或—C(═O)—替代，R2是H或一价的碳1-碳6烃基，R3和R4是H或一价的碳1-碳8烃基，M1是Li、Na、K、Mg、Zn、Al、B或Si。通过这些氟醇化合物，可以简单经济地生产氟化单体，这些单体在制备用于辐射敏感抗蚀剂组合物的聚合物中非常有用。

  公开号：

  US20070179309A1

文献信息

• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200247926A1

  公开（公告）日：2020-08-06

  Polymerization reaction is performed using a polymerizable monomer shown by the following general formula (1) and at least one monomer selected from monomers each having a structure of a salt among a lithium salt, a sodium salt, a potassium salt, and a nitrogen compound salt of a fluorosulfonic acid or the like; then, the structure of the salt of the repeating unit of a polymer obtained by the polymerization reaction is changed to the fluorosulfonic acid or the like by ion exchange. Thus, the present invention provides a polymer compound for a conductive polymer and a method for producing the polymer compound which is suitably used as a dopant for a fuel cell and a conductive material, and which is a copolymer containing a repeating unit of styrene having a 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylisobutyl ether group, and a repeating unit having any of a fluorosulfonic acid, a fluorosulfonimide group, and a n-carbonyl-fluoro-sulfonamide group.

  聚合反应使用以下一般式（1）所示的可聚合单体和至少一种选择自锂盐、钠盐、钾盐和氟磺酸盐等盐结构的单体中的单体进行；然后，通过离子交换将聚合反应得到的聚合物的重复单元的盐结构改变为氟磺酸盐或类似物。因此，本发明提供了一种用作导电聚合物的聚合物化合物以及用作燃料电池和导电材料的掺杂剂的聚合物化合物的生产方法，该聚合物是含有3,3,3-三氟-2-羟基-2-三氟甲基异丁基醚基的苯乙烯重复单元和具有氟磺酸、氟磺酰亚胺基团和n-羰基-氟磺酰胺基团中的任何一种的重复单元的共聚物。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20110294070A1

  公开（公告）日：2011-12-01

  A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

  一种聚合物是由一种具有酸敏感基团的羟基苯甲酸甲酯单体合成得到的。该聚合物作为基础树脂的正性光阻组合物具有极高的曝光前后碱溶解速率对比度、高分辨率、曝光后图案的良好轮廓和极小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。