申请人:HOFFMANN LA ROCHE
公开号:WO2001055120A1
公开(公告)日:2001-08-02
The present invention provides a process for preparing 1, 2-diheteroethylene sulfonamide of the formula (i) by reacting a pyrimidine monohalide of the formula (ii) with a mono-protected 1, 2-diheteroethylene anion of the formula M1XCH2CH2YR5 and removing the protecting group, wherein R1 is hydrogen, lower alkyl, lower alkoxy, lower alkylthio, halogen or trifluoromethyl; R2 is hydrogen, halogen, lower alkoxy, trifluoromethyl or OCH2COORa; and R3 is hydrogen, halogen, lower alkyl, lower alkylthio, trifluoromethyl, cycloalkyl, lower alkoxy, or trifluoromethoxy; or R2 and R3 together can be butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; R4 is hydrogen, lower alkyl, cycloalkyl, trifluoromethyl, lower alkoxy, lower alkylthio, lower alkylthio-lower alkyl, hydroxy-lower alkyl, hydroxy-lower alkoxy, lower alkoxy-lower alkyl, hydroxy-lower alkoxy-lower alkyl, hydroxy-lower alkoxy-lower alkoxy, lower alkylsulfinyl, lower alkylsulfonyl, 2-methoxy-3-hydroxypropoxy, 2-hydroxy-3-phenylpropyl, amino-lower alkyl, lower alkylamino-lower alkyl, di-lower alkylamino-lower alkyl, amino, lower alkylamino, di-lower alkylamino, arylamino, aryl, arylthio, aryloxy, aryl-lower alkyl or heterocyclyl; R5 is a protecting group; R6, R7, R8 and R9 are independently hydrogen, halogen, lower alkyl, trifluoromethyl, lower alkoxy, lower alkylthio, hydroxy, hydroxymethyl, cyano, carboxyl, formyl, methylsulfinyl, methylsulfonyl, methylsulfonyloxy or lower alkyloxy-carbonyloxy; or R7 together with R6 or R8 can be butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; Z is O, S, ethylene, vinylene, C(=O), OCHR10, or SCHR10; R10 is hydrogen or lower alkyl; X and Y are independently O, S, or NH; M is hydrogen, an alkaline metal or an alkaline earth metal; M1 is an alkaline metal or an alkaline earth metal; and W is a halide.
本发明提供了一种制备式(i)的1,2-二杂乙烯磺酰胺的方法,该方法通过将式(ii)的嘧啶单卤代物与式M1XCH2CH2YR5的单保护1,2-二杂乙烯负离子反应,并去除保护基,其中R1是氢、低碳基、低氧基、低硫基、卤素或三氟甲基;R2是氢、卤素、低氧基、三氟甲基或OCH2COORa;R3是氢、卤素、低碳基、低硫基、三氟甲基、环烷基、低氧基或三氟甲氧基;或R2和R3可以共同为丁二烯基、亚甲二氧基、乙二氧基或异丙基亚甲基二氧基;R4是氢、低碳基、环烷基、三氟甲基、低氧基、低硫基-低碳基、羟基-低碳基、羟基-低氧基、低氧基-低碳基、羟基-低氧基-低碳基、羟基-低氧基-低氧基、低碳基亚砜基、低碳基磺酰基、2-甲氧基-3-羟基丙氧基、2-羟基-3-苯基丙基、氨基-低碳基、低碳基氨基-低碳基、二-低碳基氨基-低碳基、氨基、低碳基氨基、二-低碳基氨基、芳基氨基、芳基、芳基硫、芳基氧、芳基-低碳基或杂环基;R5是保护基;R6、R7、R8和R9分别是氢、卤素、低碳基、三氟甲基、低氧基、低硫基、羟基、羟甲基、氰基、羧基、甲酰基、甲硫氧基基、甲磺酰基、甲磺酰氧基或低碳基氧基-羧酸酯基;或R7与R6或R8可以共同为丁二烯基、亚甲二氧基、乙二氧基或异丙基亚甲基二氧基;Z是O、S、乙烯、乙烯基、C(=O)、OCHR10或SCHR10;R10是氢或低碳基;X和Y分别是O、S或NH;M是氢、碱金属或碱土金属;M1是碱金属或碱土金属;W是卤素。