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N-[6-2(1,1-二甲氧)乙氧]-5-(2-甲氧苯氧基)[2,2’-二嘧啶]-4-基]-4-(1,1-二甲基乙基)苯磺酰胺 | 301646-60-6

中文名称
N-[6-2(1,1-二甲氧)乙氧]-5-(2-甲氧苯氧基)[2,2’-二嘧啶]-4-基]-4-(1,1-二甲基乙基)苯磺酰胺
中文别名
——
英文名称
N-[6-[2-(1,1-dimethylethoxy)ethoxy]-5-(2-methoxyphenoxy)[2,2'-bipyrimidin]-4-yl]-4-(1,1-dimethylethyl)benzenesulfonamide
英文别名
bosentan tert-butyl ether;p-tert-butyl-N-[6-(2-tert-butoxyethoxy)-5-(o-methoxyphenoxy)-2-(pyrimidin-2-yl)-pyrimidin-4-yl] benzenesulfonamide;N-[6-(2-tert-butoxy-ethoxy)-5-(2-methoxy-phenoxy)-[2,2]bipyrimidinyl-4-yl]-4-tert-butyl-benzenesulfonamide;N-[6-(2-tert-butoxyethoxy)-5-(2-methoxyphenoxy)-[2,2']bipyrimidinyl-4-yl]-4-tert-butylbenzenesulfonamide;4-tert-butyl-N-[5-(2-methoxyphenoxy)-6-[2-[(2-methylpropan-2-yl)oxy]ethoxy]-2-pyrimidin-2-ylpyrimidin-4-yl]benzenesulfonamide
N-[6-2(1,1-二甲氧)乙氧]-5-(2-甲氧苯氧基)[2,2’-二嘧啶]-4-基]-4-(1,1-二甲基乙基)苯磺酰胺化学式
CAS
301646-60-6
化学式
C31H37N5O6S
mdl
——
分子量
607.731
InChiKey
CIVGGGJJFBXIJY-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    737.9±70.0 °C(Predicted)
  • 密度:
    1.237±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    5.4
  • 重原子数:
    43
  • 可旋转键数:
    13
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.35
  • 拓扑面积:
    143
  • 氢给体数:
    1
  • 氢受体数:
    11

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • [EN] PROCESS FOR PREPARING BOSENTAN<br/>[FR] PROCÉDÉ DE PRÉPARATION DE BOSENTAN
    申请人:GENERICS UK LTD
    公开号:WO2009098517A1
    公开(公告)日:2009-08-13
    The present invention relates to a novel intermediate useful in the preparation of bosentan and to processes for the preparation of said intermediate and bosentan. The invention further relates to compositions comprising bosentan prepared according to the processes of the invention and their use in the treatment of endothelin-receptor mediated disorders.
    本发明涉及一种在制备波生坦中有用的新型中间体,以及制备所述中间体和波生坦的方法。该发明还涉及根据本发明的方法制备的波生坦组合物及其在治疗内皮素受体介导的疾病中的应用。
  • Process for the preparation of bosentan
    申请人:Laboratorios Lesvi, S.L.
    公开号:EP2368884A1
    公开(公告)日:2011-09-28
    The present invention provides a novel process for obtaining Bosentan, with few synthesis steps, by coupling the intermediate pyrimidine compound of formula I with the sulfonamide compound of formula II. The use of said efficient process prevents the use of hazardous chemicals and thus it is of considerable interest for obtaining Bosentan in a large industrial scale. The invention also refers to the novel intermediates of formula II and to a process for its production.
    本发明提供了一种新颖的制备波生汀的方法,通过将式I的中间体嘧啶化合物与式II的磺胺化合物偶联,步骤较少。采用这种高效的方法可以避免使用危险化学品,因此在大规模工业生产中获得波生汀具有相当大的兴趣。该发明还涉及到式II的新颖中间体以及其生产方法。
  • [EN] A PROCESS FOR THE PREPARATION OF BOSENTAN<br/>[FR] PROCÉDÉ POUR LA PRÉPARATION DE BOSENTAN
    申请人:MATRIX LAB LTD
    公开号:WO2012056468A1
    公开(公告)日:2012-05-03
    The present invention relates to an improved process for the preparation of Bosentan or its salt. The present invention also relates to an improved process for the deprotection of hydroxy protected Bosentan. The present invention further relates to a pharmaceutical composition comprising Bosentan of formula I with excipients.
    本发明涉及一种改进的制备波生坦或其盐的方法。本发明还涉及一种改进的去保护羟基保护波生坦的方法。本发明还涉及一种含有式I的波生坦和赋形剂的药物组合物。
  • PROCESSES FOR THE PREPARATION OF BOSENTAN AND ITS INTERMEDIATES THEREOF
    申请人:Yadav Roop Singh
    公开号:US20100256371A1
    公开(公告)日:2010-10-07
    The present invention relates to processes for the preparation of bosentan and compounds that can be used as structurally novel intermediates for the synthesis thereof, and a pharmaceutical composition of the same.
    本发明涉及用于制备博瑟坦和可用作其合成的结构新型中间体的过程,以及相应的药物组合物。
  • [EN] PREPARATION OF SULFONAMIDES<br/>[FR] PREPARATION DE SULFONAMIDES
    申请人:HOFFMANN LA ROCHE
    公开号:WO2001055120A1
    公开(公告)日:2001-08-02
    The present invention provides a process for preparing 1, 2-diheteroethylene sulfonamide of the formula (i) by reacting a pyrimidine monohalide of the formula (ii) with a mono-protected 1, 2-diheteroethylene anion of the formula M1XCH2CH2YR5 and removing the protecting group, wherein R1 is hydrogen, lower alkyl, lower alkoxy, lower alkylthio, halogen or trifluoromethyl; R2 is hydrogen, halogen, lower alkoxy, trifluoromethyl or OCH2COORa; and R3 is hydrogen, halogen, lower alkyl, lower alkylthio, trifluoromethyl, cycloalkyl, lower alkoxy, or trifluoromethoxy; or R2 and R3 together can be butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; R4 is hydrogen, lower alkyl, cycloalkyl, trifluoromethyl, lower alkoxy, lower alkylthio, lower alkylthio-lower alkyl, hydroxy-lower alkyl, hydroxy-lower alkoxy, lower alkoxy-lower alkyl, hydroxy-lower alkoxy-lower alkyl, hydroxy-lower alkoxy-lower alkoxy, lower alkylsulfinyl, lower alkylsulfonyl, 2-methoxy-3-hydroxypropoxy, 2-hydroxy-3-phenylpropyl, amino-lower alkyl, lower alkylamino-lower alkyl, di-lower alkylamino-lower alkyl, amino, lower alkylamino, di-lower alkylamino, arylamino, aryl, arylthio, aryloxy, aryl-lower alkyl or heterocyclyl; R5 is a protecting group; R6, R7, R8 and R9 are independently hydrogen, halogen, lower alkyl, trifluoromethyl, lower alkoxy, lower alkylthio, hydroxy, hydroxymethyl, cyano, carboxyl, formyl, methylsulfinyl, methylsulfonyl, methylsulfonyloxy or lower alkyloxy-carbonyloxy; or R7 together with R6 or R8 can be butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; Z is O, S, ethylene, vinylene, C(=O), OCHR10, or SCHR10; R10 is hydrogen or lower alkyl; X and Y are independently O, S, or NH; M is hydrogen, an alkaline metal or an alkaline earth metal; M1 is an alkaline metal or an alkaline earth metal; and W is a halide.
    本发明提供了一种制备式(i)的1,2-二杂乙烯磺酰胺的方法,该方法通过将式(ii)的嘧啶单卤代物与式M1XCH2CH2YR5的单保护1,2-二杂乙烯负离子反应,并去除保护基,其中R1是氢、低碳基、低氧基、低硫基、卤素或三氟甲基;R2是氢、卤素、低氧基、三氟甲基或OCH2COORa;R3是氢、卤素、低碳基、低硫基、三氟甲基、环烷基、低氧基或三氟甲氧基;或R2和R3可以共同为丁二烯基、亚甲二氧基、乙二氧基或异丙基亚甲基二氧基;R4是氢、低碳基、环烷基、三氟甲基、低氧基、低硫基-低碳基、羟基-低碳基、羟基-低氧基、低氧基-低碳基、羟基-低氧基-低碳基、羟基-低氧基-低氧基、低碳基亚砜基、低碳基磺酰基、2-甲氧基-3-羟基丙氧基、2-羟基-3-苯基丙基、氨基-低碳基、低碳基氨基-低碳基、二-低碳基氨基-低碳基、氨基、低碳基氨基、二-低碳基氨基、芳基氨基、芳基、芳基硫、芳基氧、芳基-低碳基或杂环基;R5是保护基;R6、R7、R8和R9分别是氢、卤素、低碳基、三氟甲基、低氧基、低硫基、羟基、羟甲基、氰基、羧基、甲酰基、甲硫氧基基、甲磺酰基、甲磺酰氧基或低碳基氧基-羧酸酯基;或R7与R6或R8可以共同为丁二烯基、亚甲二氧基、乙二氧基或异丙基亚甲基二氧基;Z是O、S、乙烯、乙烯基、C(=O)、OCHR10或SCHR10;R10是氢或低碳基;X和Y分别是O、S或NH;M是氢、碱金属或碱土金属;M1是碱金属或碱土金属;W是卤素。
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