THICK FILM OR ULTRATHICK FILM RESPONSIVE CHEMICAL AMPLIFICATION TYPE PHOTOSENSITIVE RESIN COMPOSITION
申请人:AZ Electronic Materials (Japan) K.K.
公开号:EP1688793A1
公开(公告)日:2006-08-09
[Object] To provide a chemically amplified photosensitive resin composition suitable for forming a thick film and a super thick film, which has high sensitivity, high film residual properties, good coating properties, high resolution and a good pattern shape, and which gives a pattern excellent in heat resistance, in a photosensitive resin composition requiring the formation of a thick resist pattern film such as in the formation of a magnetic pole of a magnetic head or of a bump.
[Solving means] A chemically amplified photosensitive resin composition including an alkali soluble novolak resin (A), a resin or compound (B) which in itself is insoluble or slightly soluble in alkali, but becomes soluble in alkali by the action of an acid, that is acid generating agent (C), and a photosensitizing agent (D) containing a quinonediazide group, as well as, if necessary, an alkali soluble acrylic resin (E) and a crosslinking agent (F) for improving film quality.
[目的]提供一种化学放大的感光树脂组合物,该组合物适用于在需要形成厚的抗蚀图案膜的感光树脂组合物中,例如在磁头的磁极或凸点的形成中,形成具有高灵敏度、高膜残留特性、良好的涂布特性、高分辨率和良好的图案形状,并且使图案具有优异的耐热性。
[解决方法]一种化学放大的感光树脂组合物,包括碱溶性酚醛树脂(A)、本身不溶于碱或微溶于碱,但在酸的作用下可溶于碱的树脂或化合物(B),即酸生成剂(C)和含有醌噻嗪基团的光敏剂(D),必要时还包括碱溶性丙烯酸树脂(E)和用于改善薄膜质量的交联剂(F)。