5-[3,4,5-Trihydroxy-6-(hydroxymethyl)oxan-2-yl]oxyoxane-2,3,4,6-tetrol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 5-[3,4,5-Trihydroxy-6-(hydroxymethyl)oxan-2-yl]oxyoxane-2,3,4,6-tetrol
• 化学式: C₁₁H₂₀O₁₁
• 分子量: 328.27
• InChiKey: AEMSWCDOLCCMHZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -4.6
• 重原子数：
  22
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  190
• 氢给体数：
  8
• 氢受体数：
  11

文献信息

• COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150004791A1

  公开（公告）日：2015-01-01

  The present invention provides a composition for forming a coating type BPSG film, which comprises: one or more structures comprising a silicic acid represented by the following general formula (1) as a skeletal structure, one or more structures comprising a phosphoric acid represented by the following general formula (2) as a skeletal structure and one or more structures comprising a boric acid represented by the following general formula (3) as a skeletal structure. There can be provided a composition for forming a coating type BPSG film which is excellent in adhesiveness in fine pattern, can be easily wet etched by a peeling solution which does not cause any damage to the semiconductor apparatus substrate, the coating type organic film or the CVD film mainly comprising carbon which are necessary in the patterning process, and can suppress generation of particles by forming it in the coating process.