申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US06346527B1
公开(公告)日:2002-02-12
A compound of the formula:
wherein
R1 is hydrogen or halogen,
R2 is hydroxy, acyl(lower)alkoxy, hydroxy(lower)alkyl, lower alkoxy(lower)alkyl, lower alkylthio(lower)alkyl, mono(or di or tri)halo(lower)alkyl, (ethoxycarbonyl)amino, sulfamoylamino, (dimethylsulfamoyl)amino, N,N-di(lower)alkylamino(lower)alkyl, hydroxyimino(lower)alkyl, lower alkoxyimino(lower)alkyl, acyl, lower alkoxycarbonyl, carbamoyl, di(lower)alkylcarbamoyl, (amino(lower)alkyl)carbamoyl, N,N-di(lower)alkylamino(lower)alkylcarbamoyl, guanidinocarbonyl, morpholinylsulfonyl, sulfamoyl, lower alkylsulfamoyl, (lower alkylsulfonyl)(lower)alkyl, guanidinocarbonyl(lower)alkenyl, lower alkylthio, cyano, acyl(lower)alkyl, acyl(lower)alkenyl, aryl which has one or more substituent(s) or a heterocyclic group which has one or more substituent(s), and
X is —O—, or a salt thereof.
该化合物的化学式为:其中R1是氢或卤素,R2是羟基、酰基(较低)烷氧基、羟基(较低)烷基、较低烷氧基(较低)烷基、较低烷基硫(较低)烷基、单(或双或三)卤(较低)烷基、(乙氧羰基)氨基、磺酰胺基、(二甲基磺酰胺)氨基、N,N-二(较低)烷基胺基(较低)烷基、羟亚胺(较低)烷基、较低烷氧亚胺(较低)烷基、酰基、较低烷氧羰基、氨基甲酰基、二(较低)烷基氨基甲酰基、(氨基(较低)烷基)甲酰基、N,N-二(较低)烷基氨基(较低)烷基甲酰基、胍基甲酰基、吗啉磺酰基、磺酰胺基、较低烷基磺酰胺基、(较低烷基磺酰基)(较低)烷基、胍基甲酰基(较低烯基)、较低烷硫、氰基、酰基(较低)烷基、酰基(较低)烯基、芳基(带有一个或多个取代基)或带有一个或多个取代基的杂环基,X是-O-,或其盐。