5-疏基吡啶-2-羧酸 | 24242-22-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡啶及其衍生物
• 中文名称: 5-疏基吡啶-2-羧酸
• 英文名称: 5-Mercapto-picolinsaeure
• 英文别名: 5-Mercaptopyridine-2-carboxylic acid；5-sulfanylpyridine-2-carboxylic acid
• CAS: 24242-22-6
• 化学式: C₆H₅NO₂S
• 分子量: 155.177
• InChiKey: CTAJWLMNJKCYMD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  51.2
• 氢给体数：
  2
• 氢受体数：
  4

安全信息

• 海关编码：
  2933399090

反应信息

• 作为反应物：
  描述：

  5-疏基吡啶-2-羧酸 、 正溴丁烷 生成 5-butylsulfanyl-pyridine-2-carboxylic acid
  参考文献：
  名称：

  YANO, MITSUO;YOSHIZAWA, JUNJI;ISHIKAWA, KIYOFUMI;HARADA, NOBUO;MATSUMOTO,+

  摘要：

  DOI：

文献信息

• Oxidation of thiols with metal nitrates supported on TAFF
  作者：Gabriel Arroyo、Roberto Osnaya、Tonatiuh Cruz、Amparo Londoño、Cecilio Álvarez、Francisco Delgado、Ricardo Santiago、René Miranda

  DOI：10.1002/hc.10138

  日期：——

  Twelve thiols were readily oxidized to the corresponding disulfides by means of four metal nitrates supported on TAFF, a bentonitic clay, under mild conditions. However, in some cases, thioethers and other interesting by-products were detected. Some of the disulfides showed antimicotical activities against Aspergillus fumigatus, Aspergillus niger, Aspergillus candidus, Microsporum gypseum, Candida

  在温和条件下，通过负载在 TAFF（一种膨润土）上的四种金属硝酸盐，12 种硫醇很容易被氧化成相应的二硫化物。然而，在某些情况下，会检测到硫醚和其他有趣的副产品。一些二硫化物显示出对烟曲霉、黑曲霉、念珠菌、石膏小孢子菌、白色念珠菌和新型隐球菌的抗菌活性 © 2003 Wiley Periodicals, Inc. Heteroatom Chem 14:262-2065; 在线发表于 Wiley InterScience (www.interscience.wiley.com)。DOI 10.1002/hc.10138
• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• Tocopheryl ester of 5-substituted picolinic acid, process for its production, and pharmaceutical composition containing it
  申请人：BANYU PHARMACEUTICAL CO., LTD.

  公开号：EP0066242A1

  公开（公告）日：1982-12-08

  An a-tocopheryl 5-substituted picolinate of the formula wherein R represents an alkyl group which may have a substituent, a lower alkenyl group, a phenyl(lower alkyl) group, or a phenyl group which may have a substituent, and Q represents a methylene group or an oxygen or sulfur atom, or a pharmaceutically acceptable acid addition salt thereof. This compound can be produced by reacting a substituted picolinic acid of the formula wherein R and Q are as defined above, or its reactive derivative with a-tocopherol of the formula and as required, contacting the resulting compound with a pharmaceutically acceptable acid. A pharmaceutical composition comprising said compound as an active ingredient is useful for the treatment of hypertension.

  一种 a-生育酚 5-取代型吡啶甲酸盐，其式如下 其中 R 代表可能具有取代基的烷基、低级烯基、苯基（低级烷基）或可能具有取代基的苯基，Q 代表亚甲基或氧原子或硫原子，或其药学上可接受的酸加成盐。该化合物可通过反应式如下的取代的吡啶甲酸制得 式中 R 和 Q 如上定义，或其反应衍生物与式中 a-生育酚反应制得。 并根据需要将所得化合物与药学上可接受的酸接触。包含上述化合物作为活性成分的药物组合物可用于治疗高血压。
• Analogues of antibiotic cc-1065
  申请人：THE UPJOHN COMPANY

  公开号：EP0154445A1

  公开（公告）日：1985-09-11

  Compounds of the formulae wherein R1 is CH3 or substituted CH2; R2, R'2 and R3 are each H, C1-5 alkyl or phenyl; X is halogen or substituted sulfonyloxy; R5 is acyl; and R50 is H or acyl. The compounds can have light-absorbing, anti-bacterial and anti-tumour utility.

  式中，R1 是 CH3 或取代的 CH2；R2、R'2 和 R3 分别是 H、C1-5 烷基或苯基；X 是卤素或取代的磺酰氧基；R5 是酰基；R50 是 H 或酰基。 这些化合物具有吸光、抗菌和抗肿瘤作用。
• Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11022880B2

  公开（公告）日：2021-06-01

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学放大正型感光树脂组合物，能够抑制非抗蚀部分出现底部（靠近支撑物表面的一面）宽度比顶部（靠近抗蚀层表面的一面）宽度窄的 "起脚 "现象；以及当使用该感光树脂组合物在基底的金属表面上形成作为电镀物品模板的抗蚀图案时产生显影残留物。感光树脂组合物中含有一种具有特定结构的巯基化合物，它包括一种在受到照射的活性射线或辐射时产生酸的酸发生器，以及一种在酸的作用下其碱溶解度增加的树脂。