4,5-dihydro-1,3-isobenzofurandione | 51938-00-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异苯并呋喃
• 英文名称: 4,5-dihydro-1,3-isobenzofurandione
• 英文别名: cyclohexa-1,3-diene-1,2-dicarboxylic acid-anhydride；Cyclohexa-1,3-dien-1,2-dicarbonsaeure-anhydrid；3,4-Dihydrophthalic anhydride；4,5-Dihydro-2-benzofuran-1,3-dione
• CAS: 51938-00-2
• 化学式: C₈H₆O₃
• 分子量: 150.134
• InChiKey: OCIDWCNTDVLGKP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  43.4
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4,5-dihydro-1,3-isobenzofurandione 生成 alkaline earth salt of/the/ methylsulfuric acid
  参考文献：
  名称：

  Abati; Contaldi, Gazzetta Chimica Italiana, 1906, vol. 36 II, p. 838,841

  摘要：

  DOI：
• 作为产物：
  描述：

  苯酐 在 sodium amalgam 、 sodium carbonate 作用下， 生成 4,5-dihydro-1,3-isobenzofurandione
  参考文献：
  名称：

  Abati; de Bernardinis, Gazzetta Chimica Italiana, 1906, vol. 36 II, p. 824,828

  摘要：

  DOI：

文献信息

• SILANE-BASED COMPOUNDS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
  申请人：CHO Changho

  公开号：US20130034814A1

  公开（公告）日：2013-02-07

  The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.

  本申请涉及一种基于硅烷的新化合物，包括该化合物的感光树脂组合物，以及包括该化合物的感光材料。根据本申请示例实施方式的含硅烷基化合物的感光树脂组合物增加了与基材的粘附强度，使得显影性能优良，在随后的过程中没有表面污渍或缺陷。因此，通过使用根据本申请示例实施方式的感光树脂组合物可以制造出具有优良质量的感光材料、彩色滤光片等。
• Abati, Gazzetta Chimica Italiana, <hi>1908</hi>, vol. 38 I, p. 153
  作者：Abati

  DOI：——

  日期：——
• COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX
  申请人：Choi Dong Chang

  公开号：US20100104981A1

  公开（公告）日：2010-04-29

  A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
• PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX
  申请人：Choi Dong Chang

  公开号：US20110101268A1

  公开（公告）日：2011-05-05

  A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
• ESTERS OF 5-HYDROXYMETHYLFURFURAL AND METHODS FOR THEIR PREPARATION
  申请人：Benecke Herman Paul

  公开号：US20130190516A1

  公开（公告）日：2013-07-25

  Disclosed are compositions and methods for the production of mono-esters and di-esters from the reaction of HMF and a reactant selected from a diacid or a diacid derivative; typical reactants are PAN, phthaloyl dichloride, dimethyl phthalate, maleic acid, and maleic anhydride or mono-esters that can be prepared from HMF and MAN.