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alpha-heptafluoropropylacrylic acid | 90715-74-5

中文名称
——
中文别名
——
英文名称
alpha-heptafluoropropylacrylic acid
英文别名
α-perfluoropropylacrylic acid;3,3,4,4,5,5,5-heptafluoro-2-methylidenepentanoic acid
alpha-heptafluoropropylacrylic acid化学式
CAS
90715-74-5
化学式
C6H3F7O2
mdl
——
分子量
240.077
InChiKey
UKGGXLOKUVDRJF-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.6
  • 重原子数:
    15
  • 可旋转键数:
    3
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.5
  • 拓扑面积:
    37.3
  • 氢给体数:
    1
  • 氢受体数:
    9

反应信息

  • 作为反应物:
    描述:
    alpha-heptafluoropropylacrylic acid尿素乙酸酐乙醇 为溶剂, 反应 0.67h, 以to give 180 mg (yield: 64%) of 5-heptafluoropropyldihydrouracil as colorless crystals的产率得到5-(Heptafluoropropyl)dihydropyrimidine-2,4(1H,3H)-dione
    参考文献:
    名称:
    Production of 5-perfluoroalkyldihydrouracil derivatives
    摘要:
    一种制备5-全氟烷基-二氢尿嘧啶衍生物的方法,其一般式为##STR1##其中R.sub.f代表全氟烷基,R.sup.1和R.sup.2分别代表氢原子或烷基、环烷基、芳香基、芳基烷基或杂环基,Y为氧或硫原子,其包括(a)将一般式为##STR2##其中X代表卤素原子或羟基的化合物与一般式为##STR3##的脲衍生物反应,但当X为羟基且R.sup.1和R.sup.2中至少有一个为氢原子时,在缩合剂的存在下进行反应,或(b)环化一般式为##STR4##的化合物和上述式(IV)的新中间体化合物。
    公开号:
    US04581452A1
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文献信息

  • Functionalized Photoreactive Compounds
    申请人:Cherkaoui Mohammed Zoubair
    公开号:US20080274304A1
    公开(公告)日:2008-11-06
    The present invention concerns functionalized photoreactive compounds of formula (I), that are particularly useful in materials for the alignment of liquid crystals. Due to the adjunction of an electron withdrawing group to specific molecular systems bearing an unsaturation directly attached to two unsaturated ring systems, exceptionally high photosensitivities, excellent alignment properties as well as good mechanical robustness could be achieved in materials comprising said functionalized photoreactive compounds of the invention.
    本发明涉及式(I)的官能化光反应化合物,特别适用于液晶对准材料。由于在特定分子系统中的不饱和键直接连接到两个不饱和环系统上附加了一个电子受体基团,因此在包含本发明的这些官能化光反应化合物的材料中可以实现异常高的光敏性、优异的对准性能以及良好的机械稳健性。
  • Process for preparing acrylate compound
    申请人:TOSOH CORPORATION
    公开号:US20030139613A1
    公开(公告)日:2003-07-24
    An acrylate compound of formula (4): 1 is produced by allowing an acrylic acid compound of formula (1): 2 to react with an unsaturated compound of formula (2) or (3): 3 In formulae (1) through (4), R 1 and R 2 are H or F, R 3 is H, F, or an alkyl, alkenyl, fluoroalkyl or fluoroalkenyl group, R 4 and R 5 are H, halogen, or an alkyl, alkenyl, halogenated alkyl or halogenated alkenyl group; and X and Y are an unsubstituted or substituted hydrocarbon group, and dashed line - - - - - means that X and Y may be bonded together to form a cyclic structure.
    通过让化学式(1):2的丙烯酸化合物与化学式(2)或(3):3的不饱和化合物发生反应,可以制备出化学式(4):1的丙烯酸酯化合物。在化学式(1)到(4)中,R1和R2为H或F,R3为H、F或烷基、烯基、氟烷基或烯基基团,R4和R5为H、卤素或烷基、烯基、卤代烷基或卤代烯基基团;X和Y为未取代或取代的碳氢基团,虚线- - - - - 表示X和Y可以连接在一起形成环状结构。
  • [EN] CYANOSTILBENES<br/>[FR] CYANOSTILBÈNES
    申请人:ROLIC AG
    公开号:WO2014191292A1
    公开(公告)日:2014-12-04
    The present invention relates to novel compounds that are particularly useful for the alignment, especially photoalignment, of slave material, especially liquid crystals for optical or electro-optical applications, such as security applications, liquid crystal devices or optical or electro-optical films.
    本发明涉及一种新型化合物,特别适用于用于光学或电光应用的从材料,尤其是液晶的定向,特别是光定向,如安全应用、液晶器件或光学或电光薄膜。
  • Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
    申请人:Ando Nobuo
    公开号:US20070149702A1
    公开(公告)日:2007-06-28
    The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
    本发明提供了一种树脂,通过辐射产生酸,是有机阳离子和阴离子聚合物的盐,其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂化学增感光阻组合物。
  • RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME
    申请人:ANDO Nobuo
    公开号:US20110165519A1
    公开(公告)日:2011-07-07
    The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
    本发明提供了一种树脂,该树脂通过辐射发生酸化作用,是有机阳离子和阴离子聚合物的盐,其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂化学增感光阻组合物。
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