Bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene | 172416-00-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene
• 英文别名: 3-ethyl-3-[[2-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane
• CAS: 172416-00-1
• 化学式: C₂₀H₃₀O₄
• 分子量: 334.4
• InChiKey: UOYIPLQCZOCTOA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  24
• 可旋转键数：
  10
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  36.9
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  、 三甲氧基酯 、 3,3-二甲基氧杂环丁烷 、 3,3-双(氯甲基)氧杂环丁烷 、 3-乙基-3-(苯氧基甲基)氧杂环丁烷 、 3-乙基-3-氧杂丁环甲醇 、 Bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene 、 在 (3-ethyl-3-oxetanylmethoxy)oligodimethylsiloxane 作用下， 以XDO, trade name, produced by Toa Gosei), tri[(3-ethyl-3-oxetanylmethoxy)methyl]benzene, bis[(3-ethyl-3-oxetanylmethoxy)methylphenyl]ether, (3-ethyl-3-oxetanylmethoxy)oligodimethylsiloxane, and compounds的产率得到Tri[(3-ethyl-3-oxetanylmethoxy)methyl]benzene
  参考文献：
  名称：

  Resist ink composition

  摘要：

  本发明提供了一种抗蚀墨水组合物，包括一个化合物（a），其分子内至少具有一个环氧乙烷基团和至少一个环氧基团，以及一种化合物（b），能够在活性能量射线辐射和/或热下启动阳离子聚合。该抗蚀墨水组合物具有高感光性，可以通过短暂加热最终固化，固化薄膜具有良好的物理性能。

  公开号：

  US20030022958A1

文献信息

• Polymerizable composition, cured material thereof and method for manufacturing the same
  申请人：——

  公开号：US20020161068A1

  公开（公告）日：2002-10-31

  The present invention provides a polymerizable composition comprising (a) an alicyclic alkane having at least one oxetanyl group and at least one epoxy group within the same molecule and (b) a compound capable of initiating cationic polymerization under irradiation of an active energy ray and/or under heat exhibits high activity in the photo- or heat-cationic ring-opening polymerization exhibiting high activity, e.g., rapid polymerizability, rapid curability, under irradiation of an active energy ray and/or under heat. The present invention also provides a polymerization product thereof.

  本发明提供了一种可聚合的组合物，包括（a）至少具有一个环氧基团和至少一个氧杂环基团的脂环烷，并且这两种基团在同一分子中，以及（b）在活性能量射线的照射和/或热下能够启动阳离子聚合的化合物，表现出高活性的光或热阳离子开环聚合，例如，在活性能量射线的照射和/或热下具有快速聚合性和快速固化性。本发明还提供了其聚合产物。
• PHOTOSENSITIVE INSULATION RESIN COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Ito Atsushi

  公开号：US20090239080A1

  公开（公告）日：2009-09-24

  An object of the present invention is to provide a cured product which is excellent in characteristics such as an electric insulation property, a heat impact resistance, an adhesive property and the like and to provide a photosensitive insulation resin composition from which the above cured product can be obtained and which is suited to uses such as an interlayer insulation film, a surface protecting layer and the like in semiconductor elements. The photosensitive insulation resin composition according to the present invention is characterized by comprising (A) a copolymer comprising 10 to 99 mole % of a constitutional unit (A1) represented by the following Formula (1) and 90 to 1 mole % of a constitutional unit (A2) represented by the following Formula (2) (provided that the total of all constitutional units constituting the above copolymer (A) is 100 mole %): (wherein R 1 represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group or an aryl group; R 2 represents a hydrogen atom or methyl; m is an integer of 1 to 3, and n is an integer of 0 to 3; and m+n≦5; R 3 represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group or an aryl group; R 4 represents a hydrogen atom or methyl; and k is an integer of 0 to 3), (B) a compound (B1) having an oxetanyl group, (C) a photosensitive acid generator, (D) a solvent and (F) cross-linked fine particles.

  本发明的目的是提供一种具有优异的电气绝缘性、耐热冲击性、粘附性等特性的固化产品，并提供一种光敏绝缘树脂组合物，该组合物适用于半导体元件中的层间绝缘膜、表面保护层等用途。本发明的光敏绝缘树脂组合物的特点在于包括(A)共聚物，该共聚物包括以下式(1)所表示的构成单元(A1)的10至99摩尔％和以下式(2)所表示的构成单元(A2)的90至1摩尔％（其中，构成上述共聚物(A)的所有构成单元的总和为100摩尔％）：（式中，R1表示具有1至4个碳原子的烷基、烷氧基或芳基；R2表示氢原子或甲基；m为1至3的整数，n为0至3的整数；且m+n≤5；R3表示具有1至4个碳原子的烷基、烷氧基或芳基；R4表示氢原子或甲基；k为0至3的整数），(B)具有氧杂环丙基基团的化合物(B1)，(C)光敏酸发生剂，(D)溶剂和(F)交联细粒子。
• COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
  申请人：JSR Corporation

  公开号：EP1235104A1

  公开（公告）日：2002-08-28

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：（A）可分解化合物；（B）折射率低于可分解化合物（A）的不可分解化合物；（C）对辐射敏感的分解剂；以及（D）稳定剂。通过图案掩膜将组合物暴露在辐射下，暴露部分的上述成分（C）和（A）被分解，暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• Radiation sensitive refractive index changing composition and refractive index changing method
  申请人：JSR Corporation

  公开号：EP1323742A2

  公开（公告）日：2003-07-02

  A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

  一种辐射敏感折射率改变组合物，其材料的折射率可通过简单的方法改变，改变后的折射率差足够大，并且无论使用条件如何，都能提供稳定的折射率图案和稳定的光学材料。 辐射敏感折射率变化组合物包括：(A) 可聚合化合物；(B) 折射率低于可聚合化合物 (A) 聚合物的不可聚合化合物；(C) 辐射敏感聚合引发剂。
• RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX
  申请人：JSR Corporation

  公开号：EP1350814A1

  公开（公告）日：2003-10-08

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：(A) 可分解化合物；(B) 折射率高于可分解化合物(A)的不可分解化合物；(C) 对辐射敏感的分解剂；(D) 稳定剂。通过图案掩膜将这种组合物暴露在辐射下，暴露部分的上述成分（C）和（A）分解，在暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。