Photo-crosslinkable polymer gate dielectrics for hysteresis-free organic field-effect transistors with high solvent resistance
作者:Eun Kyung Lee、Joo Young Kim、Jong Won Chung、Bang-Lin Lee、Youngjong Kang
DOI:10.1039/c3ra43890b
日期:——
Poly(N-(4-hydroxyphenyl)maleimide-co-4-vinylphenol) (PHPMIVP) and its derivatives were developed for polymer gate dielectrics exhibiting high chemical resistance to various organic solvents and hysteresis-free operations in FET. PHPMIVP were modified with photo-reactive side-groups including cinnamoyl (PHPMIVP-C), methacroyl (PHPMIVP-M) or 4-(6-(7-coumarinyloxyl)hexyloxy)benzoyl (PHPMIVP-CHB). Especially, PHPMIVP-CHB exhibited high thermal stability and very strong chemical resistance to various organic solvents including acetone, THF, tetraline, chloroform and chlorobenzene, which allow forming dielectric layers and semiconducting layers by sequential spin-casting processes without deterioration of device performance. Neither breakdown-voltage shift nor change in the leakage current density curve was observed after treating PHPMIVP-CHB film with various organic solvents, photoresist stripper (PRS2000) or Au etchant (KI solution). The field-effect transistors fabricated by sequential spin-casting of PHPMIVP-CHB insulating layers and PQTBTz-C12 semiconducting layers showed charge mobility with μFET = 0.029 cm2 V−1 s−1 and on/off ratio = 106 which are almost 10 times better than those of PQTBTz-C12 FETs fabricated on other polymers such as PHPMIVP, PHPMIVP-C and PHPMIVP-M.
聚(N-(4-羟基苯基)马来酰亚胺-4-乙烯基苯酚)(PHPMIVP)及其衍生物被开发用于聚合物栅极电介质,对各种有机溶剂具有很高的耐化学性,并且在 FET 中无滞后现象。PHPMIVP 被光反应侧基修饰,包括肉桂酰基(PHPMIVP-C)、甲基酰基(PHPMIVP-M)或 4-(6-(7-香豆酰氧)己氧基)苯甲酰基(PHPMIVP-CHB)。特别是,PHPMIVP-CHB 具有很高的热稳定性,对丙酮、四氢呋喃、四氯乙烯、氯仿和氯苯等各种有机溶剂具有很强的耐化学腐蚀性,因此可以通过连续旋铸工艺形成介电层和半导体层,而不会降低器件的性能。用各种有机溶剂、光刻胶剥离剂(PRS2000)或金蚀刻剂(KI 溶液)处理 PHPMIVP-CHB 薄膜后,既未观察到击穿电压偏移,也未观察到漏电流密度曲线的变化。通过顺序旋铸 PHPMIVP-CHB 绝缘层和 PQTBTz-C12 半导体层制成的场效应晶体管显示出电荷迁移率为 μFET = 0.029 cm2 V-1 s-1,导通/关断比 = 106,比在 PHPMIVP、PHPMIVP-C 和 PHPMIVP-M 等其他聚合物上制成的 PQTBTz-C12 场效应晶体管好近 10 倍。