申请人:Hasegawa Koji
公开号:US20050014092A1
公开(公告)日:2005-01-20
There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. There can be provided a resist composition which has etching resistance in a practical use level, and is excellent in an adhesion property with a substrate and an affinity with a developer, and has a sensitivity and resolving power which is far excellent compared with a conventional one, wherein swelling is small at the time of development, especially for photolithography which uses a high-energy beam as a light source, and especially be provided a chemically amplified resist composition.
本发明公开了一种聚合物,其至少包含由下述通式(1)表示的重复单元,并且该聚合物作为基础树脂含于抗蚀剂组成物中,特别是化学增感抗蚀剂组成物中。本发明可提供一种在实际使用水平上具有蚀刻抗性、与基板具有优异的粘附性和与显影剂具有亲和性,并且具有远优于传统抗蚀剂的感度和分辨率的抗蚀剂组成物,在开发时膨胀小,特别适用于使用高能光束作为光源的光刻技术,特别是化学增感抗蚀剂组成物。