新型光敏聚合物,即聚((E)-(1-(10-(4-(3-(联苯-4-基)-3-氧代丙-1-烯基)苯氧基)戊基)-1 H -1,2 ,3-三唑-4-基)丙酸甲酯)(BI-5),聚((E)-(1-(10-(4-(3-(联苯-4-基)-3-氧代丙-1-苯基)-1 H -1,2,3-三唑-4-基丙酸甲酯)(BI-6)和聚((E)-(1-(10-(4-(3-(合成了联苯-4-(基)-3-氧代丙-1-基)苯氧基)癸基)-1 H -1,2,3-三唑-四基)丙酸甲酯)(BI-10),其结构产品已被1确认1 H NMR,FT-IR和UV-可见光谱分析。通过紫外可见光谱技术评估了光交联的速率,结果揭示了合成聚合物的有效交联行为。借助Tafel极化和电化学阻抗测量,研究了这些可光交联聚合物作为缓蚀剂在1.0 M盐酸溶液(HCl)中对软钢(MS)腐蚀的抑制剂,这在文献中尚属首次。即使在非常低的浓度(5至15 pp
An ethoxy/propoxy modified pyrazoline organic matter, an application thereof, a photocurable composition, and a photoresist. The introduction of —CH
2
—CH
2
—O(EO) and/or —CH(CH
3
)—CH
2
—O(PO) enables an EO/PO modified pyrazoline organic matter to have excellent compatibility with other components in a photocuring system, and the organic matter is solid, and is easy to add and use. In addition, the ethoxy/propoxy modified pyrazoline organic matter has an absorption band of 360-400 nm, and is thus particularly suitable for use as a sensitizer in the photocuring system (such as a system containing a bisimidazole photoinitiator), thereby greatly improving the sensitivity of the photocuring system. On this basis, the EO/PO modified pyrazoline organic matter has high sensitivity enhancement, features low usage, is solid, and is easy to add and use.