4-(2-Methylpropyl)benzenesulfonic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-(2-Methylpropyl)benzenesulfonic acid
• 化学式: C₁₀H₁₄O₃S
• 分子量: 214.28
• InChiKey: QCDXVFFICCBGPI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4-(2-Methylpropyl)benzenesulfonic acid 、 三氯氧磷 生成 4-异丁基苯磺酰氯
  参考文献：
  名称：

  CESARZ, KATHRIN;PRITZKOW, W.;UHLIG, CORNELLA;VOERCKEL, V., J. PRAKT. CHEM., 331,(1989) N, C. 1011-1013

  摘要：

  DOI：
• 作为产物：
  描述：

  异丁基苯 、 三氧化硫 、 硫酸 以94%的产率得到
  参考文献：
  名称：

  CESARZ, KATHRIN;PRITZKOW, W.;UHLIG, CORNELLA;VOERCKEL, V., J. PRAKT. CHEM., 331,(1989) N, C. 1011-1013

  摘要：

  DOI：

文献信息

• UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD FOR FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20160009946A1

  公开（公告）日：2016-01-14

  Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

  提供的是一种用于形成印迹底层的组合物，其表面平整度和粘附性能优良。该用于形成印迹底层的组合物包括（A）一种具有乙烯基不饱和基团（P）和环状醚基团（T）的树脂，所述环状醚基团被选择为环氧基团和环氧乙烷基团，并且具有1000或更大的重均分子量；以及（B）一种溶剂。
• UNDERLAYER-FILM-FORMING COMPOSITION FOR IMPRINTING, AND PATTERN FORMATION METHOD
  申请人：Fujifilm Corporation

  公开号：EP2980831A1

  公开（公告）日：2016-02-03

  Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

  本发明提供了一种用于形成压印底层的组合物，其表面平整度和粘合性极佳。这种用于形成压印底层的组合物包括：(A) 具有乙烯基不饱和基团 (P) 和环醚基团 (T) 的树脂，环醚基团选自环氧乙烷基团和氧杂环丁烷基团，重量平均分子量大于等于 1000；以及 (B) 溶剂。
• Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device
  申请人：FUJIFILM Corporation

  公开号：US10191375B2

  公开（公告）日：2019-01-29

  Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represent a group selected from an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents a group selected from an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.

  本发明提供了一种用于底层成膜的树脂组合物、一种分层产品、一种形成图案的方法、一种压印形成套件和一种生产设备的工艺。 用于形成底层膜的树脂组合物包括具有通式（A）代表的基团和至少一个选自通式（B）代表的基团、环氧乙烷基团和氧杂环丁烷基团的基团的树脂、非离子表面活性剂和溶剂。Ra1 代表氢原子或甲基，Rb1 和 Rb2 各自独立地代表选自具有 1 至 20 个碳原子的未取代的直链或支链烷基和具有 3 至 20 个碳原子的未取代的环烷基的基团，Rb3 代表选自具有 2 至 20 个碳原子的未取代的直链或支链烷基和具有 3 至 20 个碳原子的未取代的环烷基的基团，Rb2 和 Rb3 可相互键合形成环。
• Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device
  申请人：FUJIFILM Corporation

  公开号：US10246605B2

  公开（公告）日：2019-04-02

  Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

  本发明提供了一种用于底层成膜的树脂组合物、一种分层产品、一种图案形成方法、一种压印形成套件和一种设备生产工艺。 本发明公开了一种用于形成底层膜的树脂组合物，该组合物通过涂敷在基底材料上形成底层膜，包括侧链中具有自由基反应基团的第一树脂、至少含有一个氟原子和一个硅原子的第二树脂以及溶剂。第二种树脂最好是含有氟原子的树脂。第一种树脂的自由基活性基团最好是（甲基）丙烯酰基。
• Under layer film-forming composition for imprints and method for forming pattern
  申请人：FUJIFILM Corporation

  公开号：US10344177B2

  公开（公告）日：2019-07-09

  Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

  本发明提供了一种用于形成压印底层的组合物，其表面平整度和粘合性极佳。这种用于形成压印底层的组合物包括：(A) 具有乙烯基不饱和基团 (P) 和环醚基团 (T) 的树脂，环醚基团选自环氧乙烷基团和氧杂环丁烷基团，重量平均分子量大于等于 1000；以及 (B) 溶剂。