2-trifluoromethylbicyclo[2.2.1]hept-5-ene-2-carboxylic acid | 370102-78-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-trifluoromethylbicyclo[2.2.1]hept-5-ene-2-carboxylic acid
• 英文别名: 2-Trifluoromethylbicyclo[2,2,1]hepta-5-ene-2-carboxylic acid；2-(trifluoromethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
• CAS: 370102-78-6
• 化学式: C₉H₉F₃O₂
• 分子量: 206.164
• InChiKey: IVQQRSCSISNRNA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2-trifluoromethylbicyclo[2.2.1]hept-5-ene-2-carboxylic acid 在 钯 氢气 作用下， 以 甲苯 为溶剂， 以to obtain 2-trifluoromethylbicyclo[2,2,1]heptane-2-carboxylic acid的产率得到2-(Trifluoromethyl)bicyclo[2.2.1]heptane-2-carboxylic acid
  参考文献：
  名称：

  CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

  摘要：

  本发明提供了一种化学放大负性光阻组合物，包括以下通式（0-1）所表示的离子盐、一种树脂，通过酸的作用和酸发生剂变得不溶于碱性，其中，Rf表示氟原子或三氟甲基基团；Y表示具有3至30个碳原子的环烃基团，环烃基团中的氢原子可以被其本身的杂原子或可被杂原子取代的一价碳氢基团所取代，杂原子可以插入到环烃基团和一价碳氢基团的环结构中；M+表示一价阳离子。可以提供一种化学放大负性光阻组合物，该组合物可以在形成图案时提高分辨率，并给出具有较少线边粗糙度（LER）的图案。

  公开号：

  US20150198877A1
• 作为产物：
  描述：

  2-(三氟甲基)丙烯酸 、 环戊二烯 以 二氯甲烷 为溶剂， 反应 12.0h， 以97%的产率得到2-trifluoromethylbicyclo[2.2.1]hept-5-ene-2-carboxylic acid
  参考文献：
  名称：

  Fluorinated (hetero)cycles via ring-closing metathesis of fluoride- and trifluoromethyl-functionalized olefins

  摘要：

  Ring-closing metathesis(RCM) has been shown to be a viable tool to incorporate fluoride and trifluoromethyl substituents in (hetero)cyclic ring systems. 2-Fluoroacrylamides were cyclized to the corresponding lactams, and trifluoromethyl- substituted olefins were cyclized to yield trifluoromethylated cyclopentenes, pyrrolines and a dihydrofuran derivative. (C) 2003 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tetlet.2003.11.093

文献信息

• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• Resist polymer and method for producing the polymer
  申请人：Yamagishi Takanori

  公开号：US20050287474A1

  公开（公告）日：2005-12-29

  Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined by gel permeation chromatography (GPC).

  本发明解决了现有技术中的问题，提供了一种抗性聚合物，其批次间、反应器间和比例间变化小，不含高聚物，溶解性和储存稳定性优异，适用于细微图案形成，以及其制备方法。本发明提供的抗性聚合物至少具有一个重复单元，其结构可被酸分解以在碱性显影剂中溶解，并具有一个带极性基团的重复单元，以增强与基底的附着力。其特征在于，根据凝胶渗透色谱（GPC）确定的分子量分布中，分子量为100,000或更高的高分子量组分（高聚物）的峰面积占整个峰面积的0.1％或更少。
• Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor
  申请人：Koyama Hiroshi

  公开号：US20060058480A1

  公开（公告）日：2006-03-16

  A polymerizable monomer of the present invention is represented by the following formula (1); R 1 , R 2 and R 3 are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group, W is a single bond or a linkage group and n is 0 or 1, where at least one of R 1 , R 2 and R 3 is a fluorine atom or a fluoroalkyl group when n= 1; and the ring in the formula may have a substituent. The polymerizable monomer of the present invention can provide an appropriate hydrophilicity or hydrophilicity and transparency to a photoresist polymer.

  本发明的可聚合单体由以下公式（1）表示；其中，R1、R2和R3分别为氢原子、氟原子、烷基或氟烷基，W为单键或连接基，n为0或1，当n=1时，R1、R2和R3中至少有一个为氟原子或氟烷基；公式中的环可能具有取代基。本发明的可聚合单体能够为光刻胶聚合物提供适当的亲水性或亲疏水性和透明度。
• Novel thiol compound, copolymer and method for producing the copolymer
  申请人：——

  公开号：US20040181023A1

  公开（公告）日：2004-09-16

  By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); 1 wherein R 1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.

  通过解决先前技术中的异议，提供了一种新型共聚物，适用于涂层聚合物，其在与基材的粘附性方面表现出色，并可作为具有耐久性的聚合物用于更细微的图案形成中的涂层膜，以适应先进的光刻技术，以及一种生产共聚物的方法，以及一种新型硫醇化合物，可用作生产共聚物中的链转移剂。本发明的新型硫醇化合物具有由式（1）表示的结构；其中R1是从具有1到15个碳原子的线性、支链或环状饱和碳氢化合物中选择的二价取代基。
• ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150198876A1

  公开（公告）日：2015-07-16

  The present invention provides the onium salt comprises the material represented by the following general formula (0-1), wherein R f represents a fluorine atom or a trifluoromethyl group; Y represents a cyclic hydrocarbon group having 3 to 30 carbon atoms, the hydrogen atom in the cyclic hydrocarbon group may be substituted by a hetero atom itself or a monovalent hydrocarbon group which may be substituted by a hetero atom(s), and the hetero atom(s) may be interposed into the cyclic structure of the cyclic hydrocarbon group and the monovalent hydrocarbon group; and M + represents a monovalent cation. There can be provided an onium salt which can improve resolution at the time of forming a pattern and give a pattern with less line edge roughness (LER) when it is used in a chemically amplified positive resist composition.

  本发明提供了含有以下通式（0-1）所表示的材料的离子盐，其中Rf表示氟原子或三氟甲基基团；Y表示具有3至30个碳原子的环烃基团，环烃基团中的氢原子可以被其本身的杂原子或可以被杂原子（们）取代的一价碳氢基团所取代，而杂原子（们）可以插入到环烃基团和一价碳氢基团的环状结构中；M+表示一价阳离子。本发明提供了一种离子盐，当它用于化学增强正性光刻胶组合物时，可以改善形成图案时的分辨率，并给出具有较少线边粗糙度（LER）的图案。