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methacrylic pivalic anhydride | 156491-92-8

中文名称
——
中文别名
——
英文名称
methacrylic pivalic anhydride
英文别名
2-Methylprop-2-enoyl 2,2-dimethylpropanoate
methacrylic pivalic anhydride化学式
CAS
156491-92-8
化学式
C9H14O3
mdl
——
分子量
170.208
InChiKey
CWDDZINVPGJVSD-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.3
  • 重原子数:
    12
  • 可旋转键数:
    4
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.56
  • 拓扑面积:
    43.4
  • 氢给体数:
    0
  • 氢受体数:
    3

反应信息

  • 作为反应物:
    描述:
    6-methyldispiro[4.1.4.3]-tetradecan-6-ol 、 methacrylic pivalic anhydride正丁基锂 作用下, 以 四氢呋喃正己烷 为溶剂, 反应 2.0h, 以44%的产率得到6-methyl-6-dispiro[4.1.4.3]tetradecyl methacrylate
    参考文献:
    名称:
    Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
    摘要:
    一种酸敏感酯单体,其为螺环结构,化学式为(1),其中Z为具有可聚合双键的一价基团,X为形成环戊烷、环己烷或去甲基环辛烷环的二价基团,R2为H或一价碳氢基团,R3和R4为H或一价碳氢基团,或者R3和R4结合在一起,代表形成环戊烷或环己烷环的二价基团,n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性,因此可以用于制备具有高分辨率的光刻胶组合物。
    公开号:
    US08791288B2
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文献信息

  • ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS
    申请人:NAKAYAMA Osamu
    公开号:US20120316349A1
    公开(公告)日:2012-12-13
    A cyclic alcohol of formula (II-1): wherein: R 2 , R 3 , and R 4 are each independently a hydrogen atom, a linear alkyl group comprising 1 to 6 carbon atoms, a branched alkyl group comprising 3 to 6 carbon atoms, or a cyclic alkyl group comprising 3 to 6 carbon atoms; or R 2 and R 3 or R 3 and R 4 combine to form an alkylene group comprising 3 to 6 carbon atoms; m is 1 or 2; R 5 , R 6 , R 7 , R 8 , R 9 , and R 10 are each independently a hydrogen atom, a linear alkyl group comprising 1 to 6 carbon atoms, a branched alkyl group comprising 3 to 6 carbon atoms, or a cyclic alkyl group comprising 3 to 6 carbon atoms; A is an oxygen atom; and B is an oxygen atom or a sulfur atom. In addition, a process for producing the cyclic alcohol of formula (II-1).
    一种化学式为(II-1)的环状醇:其中:R2、R3和R4分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团;或者R2和R3或R3和R4结合形成由3至6个碳原子组成的亚烯基基团;m为1或2;R5、R6、R7、R8、R9和R10分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团;A为氧原子;B为氧原子或硫原子。此外,一种制备化学式(II-1)的环状醇的方法。
  • ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
    申请人:Kinsho Takeshi
    公开号:US20100304295A1
    公开(公告)日:2010-12-02
    An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
    一种酸敏感酯单体具有螺环结构,其化学式如下(1),其中Z是具有可聚合双键的一价基团,X是形成环戊烷、环己烷或诺邦烷环的二价基团,R2是H或一价碳氢基团,R3和R4是H或一价碳氢基团,或者R3和R4一起表示形成环戊烷或环己烷环的二价基团,n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性,因此可以用于制备具有高分辨率的抗蚀组合物。
  • METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF
    申请人:Nakayama Osamu
    公开号:US20110009643A1
    公开(公告)日:2011-01-13
    Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative.
    提供了以下内容:1)一种丙烯酸酯衍生物的生产工艺,该衍生物可以作为聚合物的原料,用于获得一种光阻组合物,该光阻组合物能形成一种对酸具有良好反应性和热稳定性的光阻膜,并且在显影时膨胀较少,其折射率在193纳米时最好为1.72或更高,并且可以进行图案化;2)通过上述生产工艺获得的丙烯酸酯衍生物;以及3)用于上述丙烯酸酯衍生物的合成中间体醇和酯。
  • N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION
    申请人:Fukumoto Takashi
    公开号:US20120148954A1
    公开(公告)日:2012-06-14
    Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer. In the formula, R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R 2 , R 3 , R 4 , and R 5 independently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) R 2 and R 3 , or R 4 and R 5 , may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) R 3 and R 4 may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R 2 , R 3 , R 4 , and R 5 are not a hydrogen atom at the same time.
    本公开了一种N-酰基-β-内酰胺衍生物,其由以下通用式表示,从中可以获得一种能够控制酸扩散长度较短的光刻胶组合物;一种由将以下通用式表示的N-酰基-β-内酰胺衍生物聚合而成的聚合物作为起始材料之一;以及含有该聚合物的光刻胶组合物。在该式中,R1代表氢原子、甲基或三氟甲基基团;W代表烷基基团或环烷基基团;n代表0或1;而R2、R3、R4和R5中的每一个独立地代表氢原子、烷基基团、环烃基团或酰氧基团,前提是1)R2和R3,或R4和R5,可以连接在一起形成一个取代或未取代的环,该环在任意位置可能有一个氧原子,2)R3和R4可以连接在一起形成一个取代或未取代的环,该环在任意位置可能有一个氧原子,3)R2、R3、R4和R5中的所有基团不同时为氢原子。
  • TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION
    申请人:Fukumoto Takashi
    公开号:US20090029290A1
    公开(公告)日:2009-01-29
    (1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, R 1 and R 2 are taken together to form a ring together with a carbon atom to which R 1 and R 2 are bonded, and R 1 and R 2 as taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an oxygen atom at an arbitrary position; R 3 represents a hydrogen atom or a methyl group; w represents a linear, branched or cyclic alkylene group having from 1 to 10 carbon atoms; and n represents 0 or 1.)
    (1) 提供了一种用于光刻胶组合物的聚合物化合物,该聚合物化合物在曝光后的显影溶液中具有高溶解速率,并且在显影过程中膨胀小。(2) 提供了一种用于制备此类聚合物化合物的原料化合物。(3) 还提供了一种包含该聚合物化合物的光刻胶组合物。具体而言,提供了以下通式(1)表示的三级醇衍生物。(在公式中,R1和R2与碳原子一起形成环,并且R1和R2表示具有2至9个碳原子的线性、支链或环烷基,可以在任意位置含有氧原子;R3表示氢原子或甲基基团;w表示具有1至10个碳原子的线性、支链或环烷基;n表示0或1。)
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