Diethylcarbamoyl-difluor-methansulfonsaeure | 45115-08-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: Diethylcarbamoyl-difluor-methansulfonsaeure
• 英文别名: 2-(Diethylamino)-1,1-difluoro-2-oxoethanesulfonic acid
• CAS: 45115-08-0
• 化学式: C₆H₁₁F₂NO₄S
• 分子量: 231.22
• InChiKey: BKNNHSWEMHPXCH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  83.1
• 氢给体数：
  1
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  二乙胺 、 Difluoro-sulfo-acetic acid methyl ester; compound with diethyl-amine 生成 Diethylcarbamoyl-difluor-methansulfonsaeure
  参考文献：
  名称：

  Fluorine-containing ?-sultones

  摘要：

  DOI：

  10.1007/bf00908281

文献信息

• Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition
  申请人：Yamaguchi Shuhei

  公开号：US20120237874A1

  公开（公告）日：2012-09-20

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括以下任何一种化合物（A），该化合物在暴露于感光射线或辐射时会产生酸和树脂（B），其溶解速度在碱性显影剂的作用下会增加。 （通式（I）中使用的字符具有描述中提到的含义。）
• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• POSITIVE PHOTOSENSITIVE COMPOSITION
  申请人：Kodama Kunihiko

  公开号：US20090148791A1

  公开（公告）日：2009-06-11

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：YAMAGUCHI Shuhei

  公开号：US20100183980A1

  公开（公告）日：2010-07-22

  An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (B) a resin capable of increasing a dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin (B) containing a specific repeating unit having a lactone structure; and (D) a low molecular compound having a group capable of leaving by an action of an acid, and a pattern forming method uses the composition.
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
  申请人：Yamaguchi Shuhei

  公开号：US20100255418A1

  公开（公告）日：2010-10-07

  According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n≧1, m≧2 and n