2,2'-(4,4'-(propane-2,2-diyl)bis(2-methyl-4,1-phenylene))bis-(oxy)bis(methylene)dioxirane | 64164-84-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,2'-(4,4'-(propane-2,2-diyl)bis(2-methyl-4,1-phenylene))bis-(oxy)bis(methylene)dioxirane
• 英文别名: 2-[[2-Methyl-4-[2-[3-methyl-4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenoxy]methyl]oxirane
• CAS: 64164-84-7
• 化学式: C₂₃H₂₈O₄
• 分子量: 368.473
• InChiKey: MAQOIBQYRIXBAO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  27
• 可旋转键数：
  8
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.48
• 拓扑面积：
  43.5
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  吗啉 、 2,2'-(4,4'-(propane-2,2-diyl)bis(2-methyl-4,1-phenylene))bis-(oxy)bis(methylene)dioxirane 在 甲醇 作用下， 反应 3.0h， 以80%的产率得到3,3'-(4,4'-(propane-2,2-diyl)bis(2-methyl-4,1-phenylene))bis(oxy)bis(1-morpholinopropan-2-ol)
  参考文献：
  名称：

  Structural Optimization and Biological Evaluation of Substituted Bisphenol A Derivatives as β-Amyloid Peptide Aggregation Inhibitors

  摘要：

  The aggregation of A beta is a crucial step in the etiology of Alzheimer's disease. Our previous work showed that A beta undergoes alpha-helix/beta-sheet intermediate structures during the conformational transition, and an A beta aggregation inhibitor (1) was discovered by targeting the intermediates. Here, structure optimization toward compound 1 was performed and 34 novel derivatives were designed and synthesized. Nine compounds showed more effective inhibitory activity than the hit compound 1 in ThT fluorescence assay. Among them, compound 43 demonstrated more excellent inhibitory potency, which not only can suppress the aggregation of A beta but also can dissolve the preformed fibrils as shown by CD spectroscopy, PICUP and AFM assays. Cellular assay indicated that 43 has no toxicity to neuronal cells, moreover, can effectively inhibit A beta(1-42)-induced neutrotoxicity and increase the cell viability. Together, on the basis of these positive results, these novel chemical structures may provide a promising potential for therapeutic applications in AD and other types of neurodegenerative disorders.

  DOI：

  10.1021/jm1000584
• 作为产物：
  描述：

  4,4'-(1-甲基亚乙基)双(2-甲基苯酚) 、 环氧氯丙烷 在 四丁基溴化铵 、 potassium hydroxide 作用下， 反应 12.0h， 以94%的产率得到2,2'-(4,4'-(propane-2,2-diyl)bis(2-methyl-4,1-phenylene))bis-(oxy)bis(methylene)dioxirane
  参考文献：
  名称：

  Structural Optimization and Biological Evaluation of Substituted Bisphenol A Derivatives as β-Amyloid Peptide Aggregation Inhibitors

  摘要：

  The aggregation of A beta is a crucial step in the etiology of Alzheimer's disease. Our previous work showed that A beta undergoes alpha-helix/beta-sheet intermediate structures during the conformational transition, and an A beta aggregation inhibitor (1) was discovered by targeting the intermediates. Here, structure optimization toward compound 1 was performed and 34 novel derivatives were designed and synthesized. Nine compounds showed more effective inhibitory activity than the hit compound 1 in ThT fluorescence assay. Among them, compound 43 demonstrated more excellent inhibitory potency, which not only can suppress the aggregation of A beta but also can dissolve the preformed fibrils as shown by CD spectroscopy, PICUP and AFM assays. Cellular assay indicated that 43 has no toxicity to neuronal cells, moreover, can effectively inhibit A beta(1-42)-induced neutrotoxicity and increase the cell viability. Together, on the basis of these positive results, these novel chemical structures may provide a promising potential for therapeutic applications in AD and other types of neurodegenerative disorders.

  DOI：

  10.1021/jm1000584

文献信息

• Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10197914B2

  公开（公告）日：2019-02-05

  The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.

  本发明提供了一种含有（A）含有硅氧烷链的聚合物化合物的阳性感光树脂组合物，该聚合物化合物具有由通式（1）所示的重复单元和重量平均分子量为3,000至500,000，（B）能够通过光生成酸并增加在水性碱性溶液中的溶解速率的感光材料，（C）交联剂和（D）溶剂。可以提供一种阳性感光树脂组合物，可以解决在金属线路（如Cu和Al）、电极和基板上引起的剥离问题，特别是在SiN等基板上，可以在使用广泛的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上形成具有前向锥形形状的细微图案，而不会产生污点和底部轮廓。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160200877A1

  公开（公告）日：2016-07-14

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.

  本发明提供了一种含有硅骨架的聚合物化合物，其含有由通式（1）所示的重复单元。可以提供一种适用于化学增强负型光阻组合物的基础树脂的含有硅骨架的聚合物化合物，可以解决在金属布线（如Cu和Al）、电极和基板（特别是在SiN基板上）上产生的剥离问题，并且可以在图案底部和基板上不产生污点和足底轮廓的情况下形成细小的图案。
• SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160033865A1

  公开（公告）日：2016-02-04

  A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.

  提供一种硅结构承载聚合物，包括由双(4-羟基-3-烯丙基苯基)衍生物衍生的重复单元，并具有3,000-500,000的分子量。该聚合物用于化学增感负型光阻组成，克服了涂层从铜或铝的金属线路、电极和SiN基底剥离的问题。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160097973A1

  公开（公告）日：2016-04-07

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.

  本发明提供了一种含有硅骨架的聚合物化合物，其包含由通式（1）所示的重复单元，并具有3,000至500,000的重均分子量。可以提供一种适用于化学增强负型光阻组合物的基础树脂的硅骨架聚合物化合物，该组合物可以纠正在金属线路（如Cu和Al）、电极和基板（尤其是在SiN基板上）上产生的剥离问题，并且可以在使用广泛使用的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上不生成污染物和足型轮廓的情况下形成细小的图案。
• 1,3-Disubstituierte Imidazoliumsalze
  申请人：F. HOFFMANN-LA ROCHE AG

  公开号：EP0253084A2

  公开（公告）日：1988-01-20

  Die neuen Imidazoliumverbindungen der allgemeinen Formel worin das Symbol Q Arylen oder Heteroarylen, die Gruppe -NR1R2 eine basische Aminogruppe, R3 niederes Alkylthio, niederes Alkoxy oder die Gruppe -(A)n-Ra, R4 eine gesättigte oder partiell ungesättigte niedere Kohlenwasserstoffgruppe, eine basische Aminogruppe oder die Gruppe -N=CRc-Rb, -CHRcRd, -NH-CHRcRd, -NH-CO-Re oder -CHRc-CO-Re, R5. Wasserstoff, niederes Alkyl, niederes Hydroxyalkyl, niederes Alkoxyalkyl, niederes Halogenalkyl, Aryl oder einen ankondensierten Benzolring, R6 Wasserstoff oder niederes Alkyl, Ra und Rb je Aryl, Heteroaryl oder eine basische Aminogruppe, Rc Wasserstoff oder niederes Alkyl, Rd Aryl oder Heteroaryl, Re Wasserstoff, eine gegebenenfalls, über ein Sauerstoffatom gebundene, gesättigte oder partiell ungesättigte niedere Kohlenwasserstoffgruppe oder eine gegebenenfalls über eine niedere Alkylgruppe gebundene Aryl-, Heteroaryl- oder basische Aminogruppe, A Vinylen oder niederes Alkylen, n die Zahl 0 oder 1, die gestrichelte Linie eine zusätzliche Doppelbindung und das Symbol Y- ein pharmazeutisch annehmbares Anion bedeuten, und die pharmazeutisch annehmbaren Säureadditionssalze davon, besitzen wertvolle pharmakologische Eigenschaften. Sie besitzen insbesondere antibakterielle, antimykotische, protozoozide und/oder antheimintische Eigenschaften und sind insbesondere wirksam gegen parasitäre Protozoen und Würmer. Sie können nach an sich bekannten Methoden hergestellt werden.

  通式如下的新咪唑鎓化合物 in which the symbol Q denotes arylene or heteroarylene, the group -NR1R2 denotes a basic amino group, R3 denotes lower alkylthio, lower alkoxy or the group -(A)n-Ra, R4 denotes a saturated or partially unsaturated lower hydrocarbon group, a basic amino group or the group -N=CRc-Rb, -CHRcRd, -NH-CHRcRd, -NH-CO-Re or -CHRc-CO-Re, R5 denotes hydrogen, lower alkyl, lower hydroxyalkyl, lower alkoxyalkyl, lower halogenoalkyl, aryl or a fused-on benzene ring, R6 denotes hydrogen, lower alkyl, lower hydroxyalkyl, lower alkoxyalkyl, lower halogenoalkyl, aryl or a fused-on benzene ring, and R6 denotes a fused-on benzene ring.氢、低级烷基、低级羟烷基、低级烷氧基烷基、低级卤代烷基、芳基或熔合苯环，R6 表示氢或低级烷基，Ra 和 Rb 分别表示芳基、杂芳基或碱性氨基，Rc 表示氢或低级烷基，Rd 表示芳基或杂芳基，Re 表示氢、可选择通过氧原子键合的饱和或部分不饱和基团、饱和或部分不饱和低级烃基或可选择通过氧原子键合的芳基、杂芳基或碱性氨基，A 为乙烯基或低级亚烷基，n 为数字 0 或 1，虚线为附加双键，符号 Y- 为药学上可接受的阴离子，及其药学上可接受的酸加成盐具有宝贵的药理特性。特别是，它们具有抗菌、抗真菌、杀原生动物和/或抗海马肠炎的特性，对寄生原生动物和蠕虫特别有效。它们可以用已知的方法生产。