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5,5-亚甲基双(2-氨基苯酚) | 22428-30-4

中文名称
5,5-亚甲基双(2-氨基苯酚)
中文别名
——
英文名称
5,5'-methylenebis(2-aminophenol)
英文别名
3,3'-methylenebis(6-aminophenol);2-amino-5-[(4-amino-3-hydroxyphenyl)methyl]phenol
5,5-亚甲基双(2-氨基苯酚)化学式
CAS
22428-30-4
化学式
C13H14N2O2
mdl
——
分子量
230.266
InChiKey
RCYNJDVUURMJOZ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    462.8±45.0 °C(Predicted)
  • 密度:
    1.352±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.8
  • 重原子数:
    17
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.08
  • 拓扑面积:
    92.5
  • 氢给体数:
    4
  • 氢受体数:
    4

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    5,5-亚甲基双(2-氨基苯酚)吡啶四丁基氟化铵三乙胺 作用下, 以 四氢呋喃二氯甲烷 为溶剂, 反应 20.0h, 生成
    参考文献:
    名称:
    CN116332814
    摘要:
    公开号:
  • 作为产物:
    描述:
    4-[(4-氨基-3-甲氧基苯基)甲基]-2-甲氧基苯胺氢溴酸溶剂黄146 作用下, 反应 12.0h, 以80.5%的产率得到5,5-亚甲基双(2-氨基苯酚)
    参考文献:
    名称:
    SUBSTITUTED OR UNSUBSTITUTED ALLYL GROUP-CONTAINING MALEIMIDE COMPOUND, PRODUCTION METHOD THEREFOR, AND COMPOSITION AND CURED PRODUCT USING SAID COMPOUND
    摘要:
    本发明涉及一种含有取代或未取代烯丙基基团的马来酰亚胺化合物,其化学式(1)如下,其中n和m各自独立地表示1到5的整数;Aly表示一个含有取代或未取代烯丙基基团的基团,其化学式(2)如下(在化学式(2)中,Z表示直接键或具有1到10个碳原子的碳氢基团,可以具有取代基;R1、R2和R3各自独立地表示氢原子或甲基基团);MI表示一个马来酰亚胺基团,其化学式(3)如下(在化学式(3)中,R4和R5各自独立地表示氢原子或甲基基团);A表示一个具有两个苯环的结构,其化学式(4-1)或(4-2)如下(每个苯环可以具有取代基;X表示直接键或二价连接基团):
    公开号:
    US20200325100A1
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文献信息

  • Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
    申请人:Nippon Kayaku Kabushiki Kaisha
    公开号:US20200392079A1
    公开(公告)日:2020-12-17
    This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.
    这种化合物具有优异的溶剂溶解性和与树脂的兼容性,可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式(1)表示,其中在公式(1)中,R1、R2、R3、R5和R6代表羟基或烷氧基;R4分别表示含硫醚键的有机基团;R7和R9分别代表氢原子或1至4个碳的烷基基团;R8代表烷基或芳基;X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物;一种光敏树脂组合物可以包括上述光聚合引发剂,从中可以得到高灵敏度且无金属腐蚀的固化产物。
  • NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
    申请人:TOKYO UNIVERSITY OF SCIENCE FOUNDATION
    公开号:US20180370908A1
    公开(公告)日:2018-12-27
    The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R 1 to R 6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).
    本发明的目的是提供一种新的化合物,该化合物可以在受到活性能量射线照射时产生碱和自由基;一种包含该新化合物的光聚合引发剂;以及一种含有光聚合引发剂的光敏树脂组合物,该组合物具有高灵敏度和良好的储存稳定性,并且可以形成不具有金属腐蚀性的固化物品。该新化合物由式(1)表示:(其中,R1至R6独立地表示氢原子、羟基、烷氧基、除上述取代基外的有机基团等;X表示从含有环结构的饱和碳氢化合物中去除n个氢原子后的结构残基;n表示1至6的整数)。
  • NOVEL FLUORINE-CONTAINING DICARBOXYLIC ACIDS AND THEIR NOVEL POLYMER COMPOUNDS
    申请人:Narizuka Satoru
    公开号:US20090030173A1
    公开(公告)日:2009-01-29
    Disclosed is a fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
    本发明公开了一种含氟的二羧酸,其化学式表示为(1),其中n表示1-4的整数,两个羧基不相邻于芳环上。通过将含氟二羧酸与共聚单体(例如,二氨基二醇)反应,可以获得线性聚合物化合物。通过热环化,这种线性聚合物化合物可以转化为具有优异特性的另一种聚合物化合物。
  • BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
    申请人:Katayama Mami
    公开号:US20110086311A1
    公开(公告)日:2011-04-14
    A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
    一种光敏树脂组合物,具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点,其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂,以及一种聚合物前体,该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
  • PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20180107114A1
    公开(公告)日:2018-04-19
    A photosensitive resin composition capable of forming a cured film with satisfactory adhesion to substrates and excellent transparency, a polyamide resin which is used in the photosensitive resin composition, a method for producing the polyamide resin, a compound which is used as a raw material of the polyamide resin, a method for producing the compound, a method for producing a cured film using the photosensitive resin composition, and a cured film which is obtained by curing the photosensitive resin composition. The photosensitive resin composition including a resin and a photopolymerization initiator. The resin is a polyamide resin including a structural unit, which includes a specific saturated alicyclic skeleton, and at least one carboxy group esterified by a unit containing a polymerizable group of a predetermined structure.
    一种具有良好粘附性和优异透明度的光敏树脂组合物,用于形成固化膜,其中包括用于光敏树脂组合物的聚酰胺树脂,制备聚酰胺树脂的方法,用作聚酰胺树脂原料的化合物,制备该化合物的方法,使用光敏树脂组合物制备固化膜的方法,以及通过固化光敏树脂组合物获得的固化膜。光敏树脂组合物包括树脂和光聚合引发剂。该树脂是一种聚酰胺树脂,包括结构单元,其中包括特定的饱和脂环骨架,以及至少一个由具有预定结构的可聚合基含有的单元酯化的羧基。
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