5,7-undecandiol | 109898-31-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 5,7-undecandiol
• 英文别名: meso-5,7-undecanediol；Undecane-5,7-diol
• CAS: 109898-31-9
• 化学式: C₁₁H₂₄O₂
• 分子量: 188.31
• InChiKey: BVWSMNFXWYNCOJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  13
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  5,7-undecandiol 、 苯硼酸 生成 (4R,6R)-4,6-dibutyl-2-phenyl-1,3,2-dioxaborinane
  参考文献：
  名称：

  NARASAKA, KOICHI;PAI, FONG-CHANG, TETRAHEDRON, 1984, 40, N 12, 2233-2238

  摘要：

  DOI：
• 作为产物：
  描述：

  十一烷-5,7-二酮 在 sodium tetrahydroborate 作用下， 生成 (5R*,7R*)-undecane-5,7-diol 、 5,7-undecandiol
  参考文献：
  名称：

  Fragmentation of the protonated stereoisomers of 5,7-Undecanediol and its bis(trimethylsilyl) ether under conditions of isobutane chemical ionization

  摘要：

  AbstractThe chemical ionization induced fragmentation behaviour of an open chain model compound, 5,7‐undecanediol (meso and d,l stereoisomers), is studied and compared with that of previously studied alicyclic models, e.g. cyclohexanediols (cis and trans isomers). In close analogy to the latter, the major fragmentation processes are the one‐ and twofold loss of H2O from the protonated molecules [MH]+. As borne out by appropriately deuterium labelled analogues, the first loss of H2O is invariably a ‘clean’ heterolysis. The second loss is considerably more complex in that 1,3‐ and 1,4‐elimination processes occur concurrently. While the 1,4‐mode may be a direct elimination process in both types of compounds, the 1,3‐mode is rearrangement induced in both. Whereas skeletal rearrangement (ring contraction) precedes this 1,3‐elimination in the alicyclic models, hydrogen rearrangement (1,2‐hydride shift) precedes it in the open chain model. No pronounced stereochemical effect is observed on the mechanistic course of the elimination processes, but is observed in their relative ease. The trimethylsilyl ethers of the stereoisomers of 5,7‐undecanediol are also studied for analogous reactions, and are discussed in this context.

  DOI：

  10.1002/oms.1210160111

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• 芳香族アルデヒド類の製造方法
  申请人：三菱化学株式会社

  公开号：JP2004194540A

  公开（公告）日：2004-07-15

  【目的】芳香族アルデヒド類の製造方法を提供する。【構成】下記（Ｉ）式【化１】ＯＨ−Ａｒ−ＣＨ2−Ａｒ’−ＯＨ （Ｉ）（式中、Ａｒ及びＡｒ’はそれぞれ独立して置換基を有していてもよい２価のアリーレン基を表す）で表されるビス（ヒドロキシアリール）メタン化合物を、酸化酵素の存在下に酸化することを特徴とする、下記（ＩＩ）式又は（ＩＩＩ）式【化２】ＯＨ−Ａｒ−ＣＨＯ （ＩＩ）【化３】ＯＨ−Ａｒ’−ＣＨＯ （ＩＩＩ）（式中、Ａｒ及びＡｒ’は前記定義に同じ）で表される芳香族アルデヒド類の製造方法。

  目的：提供一种生产芳香醛的方法。由以下（I）式[CH1]OH-Ar-CH2-Ar'-OH (I)代表的双（羟基芳基）甲烷化合物（在式中，Ar 和 Ar'各自独立地代表二价芳基，该芳基可具有取代基。由下式（II）或（III）代表的双（羟基芳基）甲烷化合物 [化 2] OH-Ar-CHO (II) [化 3] OH-Ar'-CHO (III)（式中 Ar 和 Ar'与上述定义相同），一种生产芳香醛的方法。
• Intramolecular hydrosilylations ii the -selective reduction of β-hydroxyketones
  作者：S. Anwar、A.P. Davis

  DOI：10.1016/s0040-4020(01)86634-5

  日期：1988.1
• NARASAKA, KOICHI, PURE AND APPL. CHEM., 1985, 57, N 12, 1883-1886
  作者：NARASAKA, KOICHI

  DOI：——

  日期：——