9-Methoxy-9,10-dihydroanthracene | 78299-03-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 9-Methoxy-9,10-dihydroanthracene
• CAS: 78299-03-3
• 化学式: C₁₅H₁₄O
• 分子量: 210.276
• InChiKey: QNKVIGUKTAFJMO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  16
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  9-Methoxy-9,10-dihydroanthracene 在 acid 作用下， 以 甲醇 为溶剂， 生成 蒽
  参考文献：
  名称：

  9,10-二氢-9-蒽的叔三烯类行为

  摘要：

  9,10-二氢-9-蒽系中的仲醇通常比相应的叔醇更快地经历酸催化的消除和取代反应-这种现象归因于叔醇主要存在于三萜烯类似的带有羟基的构象中在伪赤道位置。

  DOI：

  10.1016/0040-4039(81)89002-8
• 作为产物：
  描述：

  9,10-dihydroanthracen-9-ol 在 acid 作用下， 以 甲醇 为溶剂， 生成 蒽 、 9-Methoxy-9,10-dihydroanthracene
  参考文献：
  名称：

  9,10-二氢-9-蒽的叔三烯类行为

  摘要：

  9,10-二氢-9-蒽系中的仲醇通常比相应的叔醇更快地经历酸催化的消除和取代反应-这种现象归因于叔醇主要存在于三萜烯类似的带有羟基的构象中在伪赤道位置。

  DOI：

  10.1016/0040-4039(81)89002-8

文献信息

• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150185612A1

  公开（公告）日：2015-07-02

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.

  提供一种光致射线敏感或辐射敏感的树脂组合物，包括：（A）具有特定公式表示的重复单元和能够通过酸作用分解产生极性基团的基团的树脂；以及具有特定公式表示的离子化合物，以及包括该光致射线敏感或辐射敏感的树脂组合物的抗蚀膜。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
  申请人：Kataoka Shohei

  公开号：US20130017377A1

  公开（公告）日：2013-01-17

  Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧1.5 when exposed to actinic rays or radiation.
• PATTERN FORMING METHOD AND RESIST COMPOSITION
  申请人：Iwato Kaoru

  公开号：US20120321855A1

  公开（公告）日：2012-12-20

  Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.
• PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20140212811A1

  公开（公告）日：2014-07-31

  A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.