2-Methylen-pimelinsaeure | 33229-02-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-Methylen-pimelinsaeure
• 英文别名: α-Methylen-pimelinsaeure；2-methyleneheptanedioic acid；2-Methylen-heptandisaeure；Hexen-(5)-dicarbonsaeure-(1.5)；2-Methylideneheptanedioic acid
• CAS: 33229-02-6
• 化学式: C₈H₁₂O₄
• 分子量: 172.181
• InChiKey: IEJSLSQHGVOPEE-UHFFFAOYSA-N

物化性质

• 熔点：
  88.5-89.5 °C(Solv: water (7732-18-5))
• 沸点：
  381.4±25.0 °C(Predicted)
• 密度：
  1.189±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  74.6
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-Methylen-pimelinsaeure 在 硫酸 、 sodium 、 甲苯 、 苯 作用下， 生成 6-ethoxycarbonyl-2-methyl-2-cyclohexenone
  参考文献：
  名称：

  Hiong, Annales de Chimie (Cachan, France), 1942, vol. <11>17, p. 269,299,300

  摘要：

  DOI：
• 作为产物：
  描述：

  ethyl 1-(iodomethyl)-2-oxocyclohexanecarboxylate 在 sodium hydroxide 作用下， 以 乙醇 为溶剂， 反应 14.0h， 以63%的产率得到2-Methylen-pimelinsaeure
  参考文献：
  名称：

  带有β电子吸电子基团的环烷酮的Grob / Eschenmoser断裂：无环合成中间体的一般策略†

  摘要：

  在环烷酮中引入一个β电子吸电子基团可以使CC键断裂变得容易。已经证明该反应具有大范围的环尺寸，带有各种离去和吸电子基团，并使用了各种含氮和氧的亲核试剂（> 30个实例）。已经证明了碎裂产物在制备取代的γ-内酯中的应用。据报道，机理研究提示了Grob / Eschenmoser型反应。

  DOI：

  10.1039/c0ob00632g

文献信息

• METHOD OF MAKING LIGAND FUNCTIONALIZED SUBSTRATES
  申请人：3M INNOVATIVE PROPERTIES COMPANY

  公开号：US20170217880A1

  公开（公告）日：2017-08-03

  Ligand functionalized substrates, methods of making ligand functionalized substrates, and methods of using functionalized substrates are disclosed.

  本发明揭示了配体功能化基底、制备配体功能化基底的方法以及使用功能化基底的方法。
• Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
  申请人：Isono Yoshimi

  公开号：US20090011199A1

  公开（公告）日：2009-01-08

  Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

  本发明公开了一种含氟不饱和羧酸，其化学式表示为（1），其中R1代表可聚合的双键含基团，R3代表氟原子或含氟烷基团，W代表双价连接基团。该化合物可提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并含有由式（2）表示的重复单元，其中R3和W的定义如上所述，R4、R5和R6中的每一个独立地代表氢原子、氟原子或单价有机基团，其中至少有两个R4、R5和R6可以结合形成环。该聚合物化合物可提供一种化学增强型抗蚀剂组合物，其对KrF或ArF准分子激光光线透明，具有高分辨率，并能形成具有矩形截面且不膨胀的图案。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20040241580A1

  公开（公告）日：2004-12-02

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), 1 wherein R 1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X 1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R 2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

  本发明公开了一种辐射敏感的树脂组合物，包括含有酸敏感基团的树脂和光酸发生剂。该树脂的结构为式（1），其中R1代表氢原子、一价酸敏感基团、具有1-6个碳原子且不具有酸敏感基团的烷基或具有2-7个碳原子且不具有酸敏感基团的烷基羰基基团，X1代表具有1-4个碳原子的线性或支链氟代烷基团，R2代表氢原子、具有1-10个碳原子的线性或支链烷基团或具有1-10个碳原子的线性或支链氟代烷基团。该树脂组合物表现出辐射的高透过率、高敏感性、高分辨率和良好的图案形状，并可作为化学放大型抗蚀剂在高产率下制造半导体。
• POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN
  申请人：Nagai Tomoki

  公开号：US20100063232A1

  公开（公告）日：2010-03-11

  A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n is an integer from 1 to 5.

  以下是翻译结果： 一种包括以下公式（10）所示的重复单元的树脂具有出色的辐射敏感酸发生剂性能，对环境和人体只有很小的负面影响。其中，R1代表氢原子或类似物，M+代表特定的阳离子，n为1至5的整数。
• Molecular Healing of Polymeric Materials, Coatings, Plastics, Elastomers, Composites, Laminates, Adhesives, and Sealants by Active Enzymes
  申请人：McDaniel C. Steven

  公开号：US20100210745A1

  公开（公告）日：2010-08-19

  Disclosed herein are polymeric materials such as a coating, a plastic, a laminate, a composite, an elastomer, an adhesive, or a sealant; a surface treatment such as a textile finish or a wax; a filler for such a polymeric material or a surface treatment that includes an enzyme such as an esterase (e.g., a lipolytic enzyme, a sulfuric ester hydrolase, an organophosphorus compound degradation enzyme), an enzyme (e.g., a lysozyme, a lytic transglycosylase) that degrades a cell wall and/or a cell membrane component, a biocidal or biostatic peotide, and/or a peptidase. Also disclosed herein are methods of altering a material's property such as service life, flexability, or rigidity, by incorporation of an enzyme into a material capable of being chemically crosslinked by the activity of a lipolytic enzyme, a hydrolase, and/or a urease.

  本文公开了一些聚合材料，如涂层、塑料、层压板、复合材料、弹性体、粘合剂或密封剂；一种表面处理，如纺织品涂层或蜡；一种填料，用于这样的聚合材料或表面处理，其中包括一种酶，如酯酶（例如，脂肪水解酶，硫酸酯水解酶，有机磷化合物降解酶），降解细胞壁和/或细胞膜成分的酶（例如，溶菌酶，裂解转糖基酶），生物杀菌或生物静态肽，以及/或肽酶。本文还公开了通过将酶纳入可通过脂肪水解酶、水解酶和/或脲酶的活性交联材料中来改变材料性能，如使用寿命、柔韧性或刚度的方法。