Benzylic C−H Functionalisation by [Et
<sub>3</sub>
SiH+KO
<sup>
<i>t</i>
</sup>
Bu] leads to Radical Rearrangements in
<i>o‐</i>
tolyl Aryl Ethers, Amines and Sulfides
作者:Jude N. Arokianathar、Krystian Kolodziejczak、Frances E. Bugden、Kenneth F. Clark、Tell Tuttle、John A. Murphy
DOI:10.1002/adsc.202000356
日期:2020.5.26
rearrangement products. The rearrangements arise from formation of benzyl radicals, likely formed through hydrogen atom abstraction by triethylsilyl radicals. The rearrangements involve cyclisation of the benzyl radical onto the partner arene, which, from computation, is the rate determining step. In the case of diaryl ethers, Truce‐Smiles rearrangements arise from radical cyclisations to form 5‐membered
Et 3 SiH + KO t Bu与具有邻烷基的二芳基醚,硫化物和胺的反应会导致重排产物。该重排是由苄基的形成引起的,该苄基的形成可能是通过三乙基甲硅烷基基团夺取氢原子而形成的。重排涉及将苄基环化到伙伴芳烃上,这从计算上是速率确定步骤。在二芳基醚的情况下,Truce-Smiles重排是由自由基环化形成的5元环,但对于二芳基胺,则观察到环化形成了二氢ac啶。