A simple and highly efficientmethod for the selective reduction of the C=C bond in allylicalcohols has been developed using the ruthenium(II) catalyst [RuCl(mu-Cl)(eta(6)-C(6)Me(6)}2].
使用钌(II)催化剂[RuCl(mu-Cl)(eta(6)-C(6)Me(6 )} 2]。
Asymmetric synthesis of chiral diols by the catalytic enantioselective dialkylation of tere-, iso-, and phthalaldehydes and by a catalytic enantioselective autoinductive reaction
Optically pure aromatic diols were synthesized by the highly enantioselective dialkylation of aromatic dialdehydes with dialkylzincs in the presence of a catalytic amount of chiral aminoalcohol 1 or chiral thiophosphoramide alcohol 2 with Ti(O-i-Pr)4. The chiral titanium(IV) alkoxide of 4b, a diisopropylated product of isophthalaldehyde, catalyzed the addition of diisopropylzinc to isophthalaldehyde
Enantioselective Catalysis of Hetero Diels−Alder Reaction and Diethylzinc Addition Using a Single Catalyst
作者:Haifeng Du、Kuiling Ding
DOI:10.1021/ol034143c
日期:2003.4.1
[reaction: see text] Integration of two asymmetric reactions in one pot with the promotion of a single catalyst has been achieved in high efficiency and excellent stereoselectivity for hetero Diels-Alderreaction of Danishefsky's diene and diethylzinc addition to aldehydes. The strategy described in the present work demonstrated the ability of a single catalyst to promote two distinct enantioselective
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
申请人:FUJIFILM Corporation
公开号:US10545405B2
公开(公告)日:2020-01-28
Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
Halogen-magnesium exchange of various aryl halides is achieved with a magnesium ate complex at low temperatures; Tributylmagnesate ((Bu3MgLi)-Bu-n) induces facile iodine-magnesium exchange at -78 degreesC. Dibutylisopropylmagnesate ((PrBu2MgLi)-Pr-i-Bu-n) is more reactive than (Bu3MgLi)-Bu-n, and this reagent accomplishes selective bromine-magnesium exchange at -78 degreesC. This procedure is utilized for the preparation of various polyfunctionalized arylmagnesium species. The exchange of alkenyl halides using this method proceeds with retention of configuration of the double bond.