A method for producing inexpensively in a high yield a halogen-containing aromatic compound, particularly a halogen-containing aromatic compound incorporating therein a bromodifluoroalkyl group, and a halogen-containing naphthalene compound useful as a raw material for a resin excelling in heat resistance, chemical resistance and water repellency, and having a low dielectric constant and a low refractivity are provided. This invention relates to a method for the production of an aromatic compound (II) having a (CH2)nCX2Br group (wherein X represents a fluorine or chlorine atom and the X's may be same or different, and n is an integer in the range of 0 to 4) by the reaction of photo-bromination of an aromatic compound (I) having a (CH2)nCX2H group (wherein X and n are as defined above) with a brominating agent, wherein the photo-bromination reaction is carried out while removing hydrogen bromide generated in the reaction system and/or in an atmosphere of a low oxygen content, and a halogen-containing naphthalene compound represented by the following formula (1):
wherein Y represents -CF2H, -CF2Br, or -CHO group, Z1 and Z2 independently represent a halogen atom, and p and q independently are an integer in the range of 0 to 3.
本发明提供了一种以低成本高产率生产含卤素芳香族化合物,特别是其中含有
溴二氟烷基的含卤素芳香族化合物的方法,以及一种可用作耐热性、耐
化学性和憎
水性优异且具有低介电常数和低折射率的
树脂原料的含卤素
萘化合物。本发明涉及一种芳香族化合物 (II) 的生产方法,该芳香族化合物 (II) 具有 (
CH2)nCX2Br 基团(其中 X 代表
氟原子或
氯原子,X 可以相同或不同,n 为 0 至 4 范围内的整数),该芳香族化合物 (II) 通过具有 ( )nCX2H 基团(其中 X 和 n 如上定义)的芳香族化合物 (I) 与
溴化剂的光
溴化反应生产、其中,光
溴化反应是在除去反应体系中产生的
溴化氢和/或在低
氧气氛中进行的,含卤素的
萘化合物由下式(1)表示:
其中 Y 代表 -
CF2H、-
CF2Br 或 -CHO 基团,Z1 和 Z2 独立地代表卤素原子,p 和 q 独立地为 0 至 3 范围内的整数。