bis(4-(methylsulfonyl)phenyl)methane | 22183-07-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis(4-(methylsulfonyl)phenyl)methane
• 英文别名: Di-(p-Methansulfonyl-phenyl)-methan；1-Methylsulfonyl-4-[(4-methylsulfonylphenyl)methyl]benzene
• CAS: 22183-07-9
• 化学式: C₁₅H₁₆O₄S₂
• 分子量: 324.422
• InChiKey: FDFSQGQXEOGBND-UHFFFAOYSA-N

物化性质

• 沸点：
  556.7±50.0 °C(Predicted)
• 密度：
  1.285±0.06 g/cm3(Temp: 20 °C; Press: 760 Torr)(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  bis(4-(methylsulfonyl)phenyl)methane 生成 p,p'-Dimethansulfonyl-benzophenon
  参考文献：
  名称：

  Topchil,V.A.; Zavgorodnii,S.V., Journal of Organic Chemistry USSR (English Translation), 1969, vol. 5, p. 130 - 131

  摘要：

  DOI：
• 作为产物：
  描述：

  1-溴-4-[(4-溴苯基)甲基]苯 在 正丁基锂 、 双氧水 作用下， 以 四氢呋喃 、 溶剂黄146 为溶剂， 反应 17.0h， 生成 bis(4-(methylsulfonyl)phenyl)methane
  参考文献：
  名称：

  Carbon acidity. 66. Equilibrium ion pair acidities of substituted diphenylmethanes in cyclohexylamine

  摘要：

  DOI：

  10.1021/ja00310a037

文献信息

• Oxime sulfonates and the use thereof as latent acids
  申请人：Yamato Hitoshi

  公开号：US20100167178A1

  公开（公告）日：2010-07-01

  Compounds of the formula (I), (II) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R′ 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optionally substituted by a group of formula (IV); Ar′ 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar′ 1 comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

  化合物的公式为（I），（II）或（III），其中R1例如为C1-C18烷基磺酰基，C1-C10卤代烷基磺酰基，樟脑磺酰基，苯基-C1-C3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲磺酰基或杂环芳基磺酰基，R'1例如为苯基二磺酰基，R2例如为CN，C1-C10卤代烷基或被（IV）取代的C1-C10卤代烷基；Ar1例如为苯基，可选地被公式（IV）的基团取代；Ar'1例如为苯基，可选地被公式（IV）的基团取代；A1，A2和A3独立地例如为氢，卤素，CN或C1-C18烷基；D2例如为直接键，O，（CO）O，（CO）S，SO2，OSO2或C1-C18烷基；或A3和D2一起形成C3-C30环烯基；或A2和D2与它们所附着的乙烯基双键的碳一起形成C3-C30环烷基；D3和D4例如独立地为直接键，O，S，C1-C18烷基或C3-C30环烷基，至少其中之一的基团R2，Ar1或Ar'1包含公式（IV）的基团，适用作光激发酸给体，并用于制备相应的聚合物，以用于化学增强型光刻胶。
• Oxime Derivatives And Use Thereof As Latent Acids
  申请人：Yamato Hitoshi

  公开号：US20080085458A1

  公开（公告）日：2008-04-10

  The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R 1 is for example C 1 -C 18 alkylsulfonyl or phenylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R 1 is a group X 1 , X 2 and X 3 independently of each other are O or S; R′ 1 , is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R 2 is halogen or C 1 -C 10 haloalkyl; X is halogen; Ar 1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′ 1 is heteroarylene, optionally substituted; R 8 , R 9 , R 10 and R 11 for example are C 1 -C 6 alkyl which is unsubstituted or substituted by halogen; or R 8 , R 9 and R 10 are phenyl which is unsubstituted or substituted by C 1 -C 4 alkyl or halogen; or R 10 and R 11 together are 1,2-phenylene or C 2 -C 6 alkylene which is unsubstituted or substituted by C 1 -C 4 alkyl or halogen.
• US7244544B2
  申请人：——

  公开号：US7244544B2

  公开（公告）日：2007-07-17
• US7687220B2
  申请人：——

  公开号：US7687220B2

  公开（公告）日：2010-03-30
• Carbon acidity. 66. Equilibrium ion pair acidities of substituted diphenylmethanes in cyclohexylamine
  作者：Andrew Streitwieser、Erich A. Vorpagel、Chia Chung Chen

  DOI：10.1021/ja00310a037

  日期：1985.11