申请人:USV PHARMACEUTICAL CORPORATION
公开号:EP0178381A2
公开(公告)日:1986-04-23
Compounds of the structure:
and pharmaceutically acceptable salts thereof, wherein
R7 is H or halogen;
R, and R2 are independently OH, lower alkyl, lower alkoxy, aryloxy, heteroaryloxy, heteroaryl lower alkoxy, aryl, heteroaryl, aryl lower alkyl, aryl lower alkoxy, halogenated aryl lower alkoxy, lower alkenyl, lower alkynyl, lower alkenoxy, lower alkynoxy, halogen, trifluoromethyl, cyclopropy-Imethoxy or cyclohexenoxy;
A is H, aryl, lower alkyl, aryl lower alkyl or heteroaryl; and
B is
or
is an amino acid, N-lower alkyl amino acid, N-aryl lower alkyl amino acid or N-heteroaryl amino acid, or lower alkyl esters or amides thereof;
n = 0-6;
M is H, lower alkyl, or CH2OR5;
R5 is H, lower alkyl, aryl, aryl lower alkyl or heteroaryl;
R6 is lower alkyl, aryl, aryl lower alkyl or heteroaryl;
E is OH, lower alkyl, aryl or heteroaryl;
F is
and
G is OH, lower alkyl, lower alkoxy, aryloxy, heteroaryl, aryl lower alkyl, aryl lower alkoxy, halogenated aryl lower alkoxy, lower alkenyl, lower alkynyl, lower alkenoxy, lower alkynoxy, halogen or trifluoromethyl.
结构的化合物:
及其药学上可接受的盐类,其中
R7 是 H 或卤素;
R和R2独立地为OH、低级烷基、低级烷氧基、芳氧基、杂芳氧基、杂芳基低级烷氧基、芳基、杂芳基、芳基低级烷基、芳基低级烷氧基、卤代芳基低级烷氧基、低级烯基、低级炔基、低级烯氧基、低级炔氧基、卤素、三氟甲基、环丙基甲氧基或环己烯氧基;
A 是 H、芳基、低级烷基、芳基低级烷基或杂芳基;以及
B 是
或
是氨基酸、N-低级烷基氨基酸、N-芳基低级烷基氨基酸或 N-杂芳基氨基酸,或其低级烷基酯或酰胺;
n = 0-6;
M 是 H、低级烷基或 CH2OR5;
R5 是 H、低级烷基、芳基、芳基低级烷基或杂芳基;
R6 是低级烷基、芳基、芳基低级烷基或杂芳基;
E 是 OH、低级烷基、芳基或杂芳基;
F 是
和
G 是 OH、低级烷基、低级烷氧基、芳氧基、杂芳基、芳基低级烷基、芳基低级烷氧基、卤代芳基低级烷氧基、低级烯基、低级炔基、低级烯氧基、低级炔氧基、卤素或三氟甲基。