7-chloro-5-methyl-tetrazolo[1,5-a]pyrimidine | 115761-25-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪类
• 英文名称: 7-chloro-5-methyl-tetrazolo[1,5-a]pyrimidine
• 英文别名: 7-Chlor-5-methyl-tetrazolo[1,5-a]pyrimidin；7-Chloro-5-methyltetrazolo[1,5-a]pyrimidine
• CAS: 115761-25-6
• 化学式: C₅H₄ClN₅
• 分子量: 169.573
• InChiKey: QWVCLWSAHCDEPJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  56
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  7-chloro-5-methyl-tetrazolo[1,5-a]pyrimidine 在 乙醇 、 一水合肼 作用下， 生成 (5-methyl-tetrazolo[1,5-a]pyrimidin-7-yl)-hydrazine
  参考文献：
  名称：

  Kano; Makisumi, Chemical and pharmaceutical bulletin, 1958, vol. 6, p. 583,585

  摘要：

  DOI：
• 作为产物：
  描述：

  5-methyl-3H,7H-[1,2,3,4]tetrazolo[1,5-a]pyrimidin-7-one 在 三氯氧磷 作用下， 生成 7-chloro-5-methyl-tetrazolo[1,5-a]pyrimidine
  参考文献：
  名称：

  The Structure of Certain Polyazaindenes. II. The Product from Ethyl Acetoacetate and 3-Amino-1,2,4-triazole

  摘要：

  DOI：

  10.1021/jo01088a014

文献信息

• Cephalosporin .beta.-lactam compound and medicinal composition
  申请人：Sankei Pharmaceutical Company Ltd.

  公开号：US04966900A1

  公开（公告）日：1990-10-30

  There are disclosed a .beta.-lactam compound represented by the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 are independently a hydrogen atom or a lower alkyl group; M is a hydrogen atom, a protective group or an eliminatable group which is easily hydrolyzable in a human body; R' and R" are independently a hydrogen atom or a protective group; A is a mercapto group substituted by a substituted or unsubstituted polycyclic nitrogen-containing heterocyclic ring or a group represented by the following formula (a): --OOCNR.sub.3 R.sub.4 (a) where R.sub.3 and R.sub.4 are independently a hydrogen atom or a lower alkyl group, provided that R.sub.1 and R.sub.2 are both hydrogen atoms, both R.sub.3 and R.sub.4 being hydrogen atoms are excluded, or its pharmaceutically acceptable salt, and a method for preparing the same , medicinal composition for microbism therapy containing the same and intermediates for synthesis of the same.

  公开了一种β-内酰胺化合物，其化学式为(I)：##STR1##其中R₁和R₂分别为氢原子或较低的烷基基团；M为氢原子、保护基或易在人体中水解的可消除基团；R'和R"分别为氢原子或保护基；A为经取代或未取代多环氮杂环烃环取代的巯基或以下式(a)所表示的基团：--OOCNR₃R₄(a)，其中R₃和R₄分别为氢原子或较低的烷基基团，前提是R₁和R₂均为氢原子，排除R₃和R₄均为氢原子的情况，或其药学上可接受的盐，以及制备该化合物的方法、含有该化合物的微生物治疗药物组合物和合成该化合物的中间体。
• Beta-Lactam compound, method for preparing the same, medicinal composition for bacterially infectious disease therapy containing the same and intermediates for synthesis of the same
  申请人：SANKEI PHARMACEUTICAL COMPANY LIMITED

  公开号：EP0254495A2

  公开（公告）日：1988-01-27

  There are disclosed a β-lactam compound represented by the formula (I): wherein R₁ and R₂ are independently a hydrogen atom or a lower alkyl group; M is a hydrogen atom, a protective group or an eliminatable group which is easily hydrolyzable in a human body; Rʹ and Rʺ are independently a hydrogen atom or a protective group; A is a mercapto group substituted by a sub­stituted or unsubstituted polycyclic nitrogen-con­taining heterocyclic ring or a group represented by the following formula (a):     -OOCNR₃R₄      (a) where R₃ and R₄ are independently a hydrogen atom or a lower alkyl group, provided that R₁ and R₂ are both hydrogen atoms, both R₃ and R₄ being hydrogen atoms are excluded, or its pharmaceutically acceptable salt, and a method for preparing the same, medicinal composition for microbism therapy containing the same and intermediates for synthesis of the same.

  本发明公开了一种β-内酰胺化合物，由式(I)表示： 其中 R₁ 和 R₂ 独立地为氢原子或低级烷基；M 为氢原子、保护基团或在人体内易水解的可消除基团；Rʹ 和 Rʺ 独立地为氢原子或保护基团；A 为被取代或未取代的多环含氮杂环取代的巯基或下式(a)所代表的基团： -OOCNR₃R₄ (a) 其中 R₃ 和 R₄ 独立地为氢原子或低级烷基、 但 R₁ 和 R₂ 均为氢原子，R₃ 和 R₄ 均为氢原子者除外、 或其药学上可接受的盐，以及制备上述物质的方法、含有上述物质的微生物治疗药物组合物和合成上述物质的中间体。
• Cyclization of Certain Heterocyclic Azides
  作者：GEORGE A. REYNOLDS、JAMES A. VanALLAN、JOHN F. TINKER

  DOI：10.1021/jo01091a010

  日期：1959.9
• POLISHING COMPOSITION AND METHOD OF POLISHING WITH THE SAME
  申请人：Takenouchi Kenji

  公开号：US20070287362A1

  公开（公告）日：2007-12-13

  A polishing composition comprises: at least one compound selected from tetrazole compounds and derivatives thereof and anthranilic acid compounds and derivatives thereof; abrasive particles comprising associative abrasive particles; and an oxidizing agent.
• METAL-POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHOD BY USING THE SAME
  申请人：KATO Tomoo

  公开号：US20080188079A1

  公开（公告）日：2008-08-07

  The present invention provides a metal-polishing composition for use in chemical mechanical polishing of semiconductor devices, comprising: (a) a compound represented by the following Formula A, (b) a compound represented by the following Formula B, (c) an abrasive grain, and (d) an oxidizing agent: in Formula A, R 1 represents an alkyl group having 1 to 3 carbon atoms; and R 2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and in Formula B, R 3 , R 4 , and R 5 each independently represent a hydrogen atom, or an alkyl, aryl, alkoxy, amino, aminoalkyl, hydroxy, hydroxyalkyl, carboxy, carboxyalkyl or carbamoyl group.