Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups
作者:Rajesh K. Deshpande、Geoffrey I. N. Waterhouse、Geoffrey B. Jameson、Shane G. Telfer
DOI:10.1039/c1cc12884a
日期:——
Photolabile groups can be incorporated into metalâorganic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.