2-甲氧基甲基-丁酸 | 10500-25-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 2-甲氧基甲基-丁酸
• 英文名称: 2-methoxymethyl-butyric acid
• 英文别名: 2-Methoxymethyl-buttersaeure；2-methoxymethylbutyric acid；α-(Methoxymethyl)buttersaeure；2-Aethyl-3-methoxy-propionsaeure；2-(Methoxymethyl)butanoicacid；2-(methoxymethyl)butanoic acid
• CAS: 10500-25-1
• 化学式: C₆H₁₂O₃
• 分子量: 132.159
• InChiKey: WFZMSGKKLBCPRL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2-甲氧基甲基-丁酸 在 氯化亚砜 作用下， 以 Petroleum ether 为溶剂， 生成 2-methoxymethyl-butyryl chloride
  参考文献：
  名称：

  Syntheseversuche in der Emetinreihe

  摘要：

  DOI：

  10.1002/ardp.19642970404
• 作为产物：
  描述：

  ethyl-methoxymethyl-malonic acid diethyl ester 在 氢氧化钾 作用下， 生成 2-甲氧基甲基-丁酸
  参考文献：
  名称：

  Acid Amides as Hypnotics. III. Disubstituted Acetamides

  摘要：

  DOI：

  10.1021/ja01855a081

文献信息

• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170371241A1

  公开（公告）日：2017-12-28

  A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va 1 is a divalent hydrocarbon group. n a1 represents an integer of 0 to 2. Ra′ 12 and Ra′ 13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′ 14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R b1 represents a cyclic hydrocarbon group. Y b1 represents a divalent linking group containing an ester bond. V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M m+ is an m-valent organic cation.

  一种电阻组分，包含具有一般式（a0-1）所代表的结构单元的树脂组分，以及一种由一般式（b1）所代表的化合物。在一般式（a0-1）中，R是氢原子、烷基或卤代烷基。Va1是双价碳氢基团。na1表示0至2的整数。Ra′12和Ra′13是具有1至10个碳原子的单价链饱和碳氢基团或氢原子。Ra′14是苯基、萘基或蒽基。在一般式（b1）中，Rb1代表环烃基。Yb1代表含有酯键的双价连接基团。Vb1代表烷基、氟化烷基或单键。m是1或更多的整数，Mm+是m价有机阳离子。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200174365A1

  公开（公告）日：2020-06-04

  A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that one or more of R bd1 to R bd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X − represents a counter anion.

  一种抗蚀组合物，含有基础材料组分，其在显影溶液中的溶解性由酸的作用和由化合物代表的公式（bd1）改变；在公式中，Rbd1到Rbd3各自独立地代表可能具有取代基的芳基，前提是Rbd1到Rbd3中的一个或多个是可能具有取代基的芳基，而这些芳基中至少有一个可能具有取代基的氟代烷基与公式中与硫原子相结合的碳原子相邻的碳原子结合，可能具有取代基的氟代烷基的总数为2或更多；X−代表一个对离子。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20180149973A1

  公开（公告）日：2018-05-31

  A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R 01 to R 014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 01 to R 014 may be mutually bonded to form a ring structure, provided that at least two of R 01 to R 014 are mutually bonded to form a ring structure, and at least one of R 01 to R 014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m).

  一种抗蚀组合物，包括在酸的作用下在显影溶液中表现出改变溶解度的基础组分，以及一种具有阴离子基团和阳离子基团的化合物（B1），其由一般式（b1）表示（其中R01至R014分别独立地表示氢原子或可能具有取代基的碳氢基团，或者R01至R014中的两个或两个以上可能相互键合形成环结构，前提是至少两个R01至R014相互键合形成环结构，至少一个R01至R014具有阴离子基团，整体上阴离子基团形成带有价数n的阴离子；n表示1或更多的整数；表示1或更多的整数；Mm+表示具有价数m的有机阳离子）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190107779A1

  公开（公告）日：2019-04-11

  A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra 01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra 01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra 02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra 01 is bonded; and when Ra 01 is an alkyl group, Ra 02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.

  一种抗蚀组合物，包括具有由公式（a0-1）所代表的化合物衍生的结构单元的树脂组分，其中W代表含有聚合基团的基团；Ra01代表含有氧原子或硫原子的烷基或芳香杂环基团；在Ra01为含有氧原子或硫原子的芳香杂环基团的情况下，Ra02是与Ra01连接的三级碳原子（*C）一起形成含有电子提取基团的脂环基团的基团；而当Ra01为烷基时，Ra02是含有电子提取基团的脂环基团与含有氧原子或硫原子的芳香杂环基团形成的紧缩环。