COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20200361843A1
公开(公告)日:2020-11-19
A compound represented by the following formula (1).
(In the formula (1), A is a group containing a heteroatom; R
1
is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R
2
to R
5
are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R
4
and/or at least one R
5
is a hydroxy group and/or a thiol group; m
2
and m
3
are each independently an integer of 0 to 8; m
4
and m
5
are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p
2
to p
5
are each independently an integer of 0 to 2.)
以下是由以下式子(1)表示的化合物。(在式子(1)中,A是含有杂原子的基团;R1是具有1到30个碳原子并可选地具有取代基的2n价基团;R2至R5分别是线性,支链或环状烷基,具有1到30个碳原子并可选地具有取代基,具有6到30个碳原子并可选地具有取代基的芳基,具有2到30个碳原子并可选地具有取代基的烯基,具有2到30个碳原子并可选地具有取代基的炔基,具有1到30个碳原子并可选地具有取代基的烷氧基,卤素原子,硝基,氨基,羧酸基,交联基,解离基,硫醇基或羟基,其中烷基,芳基,烯基和烷氧基各自可选地包含醚键,酮键或酯键,并且至少有一个R4和/或至少有一个R5是羟基和/或硫醇基;m2和m3分别是0到8的整数;m4和m5分别是0到9的整数;n是1到4的整数;p2到p5分别是0到2的整数。)