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2-methyl-2-propenoic acid, 2-oxiranylethyl ester | 55750-22-6

中文名称
——
中文别名
——
英文名称
2-methyl-2-propenoic acid, 2-oxiranylethyl ester
英文别名
2-(Oxiran-2-yl)ethyl 2-methylprop-2-enoate
2-methyl-2-propenoic acid, 2-oxiranylethyl ester化学式
CAS
55750-22-6
化学式
C8H12O3
mdl
——
分子量
156.181
InChiKey
PTBAHIRKWPUZAM-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    211.4±13.0 °C(Predicted)
  • 密度:
    1.067±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.7
  • 重原子数:
    11
  • 可旋转键数:
    5
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.62
  • 拓扑面积:
    38.8
  • 氢给体数:
    0
  • 氢受体数:
    3

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    描述:
    2-methyl-acrylic acid but-3-enyl ester甲基三辛基氯化铵 sodium hydroxide 、 sodium tungstate 、 双氧水 作用下, 以 二氯甲烷磷酸 为溶剂, 反应 23.0h, 以52%的产率得到2-methyl-2-propenoic acid, 2-oxiranylethyl ester
    参考文献:
    名称:
    H 2 O 2 -Na 2 WO 4体系在相转移催化下通过不饱和(甲基)丙烯酸酯的选择性环氧化合成环氧(甲基)丙烯酸酯。
    摘要:
    研究了各种经典的环氧化剂对不饱和(甲基)丙烯酸酯的选择性环氧化。结果表明,在相转移催化下,通过使用H 2 O 2(20%)-Na 2 WO 4体系可以得到高选择性和高收率。在这些条件下,严格控制温度和初始pH值可防止在这些选择性环氧化过程中发生聚合。结果表明,环氧化的选择性取决于两个双键亲核性的差异。
    DOI:
    10.1016/s0040-4020(01)90120-6
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文献信息

  • PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
    申请人:FUJIFILM Corporation
    公开号:US20130171415A1
    公开(公告)日:2013-07-04
    Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar 1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R 2 s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.
    揭示了一种光敏树脂组合物,包括:(组分A)由式(1)表示的肟磺酸盐化合物;(组分B)包括具有可被酸分解的基团的树脂,该基团通过酸分解形成羧基或酚羟基;和(组分C)溶剂 其中在式(1)中,R1表示烷基、芳基或杂芳基,每个R2独立地表示氢原子、烷基、芳基或卤素原子,Ar1表示邻芳撑基或邻杂芳撑基,X表示O或S,n表示1或2,前提是在化合物中存在两个或两个以上的R2时,至少有一个表示烷基、芳基或卤素原子。
  • [EN] SULFONIUM SULFATES, THEIR PREPARATION AND USE<br/>[FR] SULFATES DE SULFONIUM, LEUR PRÉPARATION ET UTILISATION
    申请人:BASF SE
    公开号:WO2012113829A1
    公开(公告)日:2012-08-30
    The present invention relates to a heat-curable composition comprising (a) at least one compound which is capable of undergoing cationic polymerization; and (b) at least one sulfonium sulfate selected from compounds of the formulae Ia and Ib where Yn- is a monovalent or divalent anion selected from (1) where n, M, R1 to R10 are as defined in claim 1 and in the description. The present invention also relates to novel sulfonium sulfates of the formulae Ia and Ib, to a process for curing cationically polymerizable material and to the cured material obtained by said process.
    本发明涉及一种热固化组合物,包括(a)至少一种能够进行阳离子聚合的化合物;和(b)选择自式Ia和Ib的至少一种砜酸盐,其中Yn-是从(1)中选择的一价或二价阴离子,其中n、M、R1至R10如权利要求1和描述中所定义。本发明还涉及式Ia和Ib的新型砜酸盐,以及用于固化阳离子聚合材料的工艺和通过该工艺获得的固化材料。
  • [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
    申请人:BASF SE
    公开号:WO2016124493A1
    公开(公告)日:2016-08-11
    Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).
    化合物的化学式(I)和(IA),其中X为-O(CO)-;R1为C1-C12卤代烷基或C6-C10卤代芳基;R2位于香豆素环的第7位,为OR8;R2a、R2b和R2C彼此独立地为氢;R3为C1-C8卤代烷基或C1-C8卤代烷基;R4为氢;R8为C1-C6烷基,适用于作为感光酸给体,用于制备光刻胶组合物,例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器(LCD)的制备。
  • Adhesion promoting photoinitiators for UV cured coatings over metal surfaces
    申请人:Galbo James P.
    公开号:US20090104464A1
    公开(公告)日:2009-04-23
    Compounds containing both photoinitiator moieties and adhesion promoting moieties and coating formulations containing them are disclosed, in particular, durable UV cured primer layers for coil coatings. One embodiment includes a coated metal surface which comprises a metal substrate with at least one surface immediately adjacent to a coating layer comprising a photoinitiator chemically bound to an adhesion promoter is disclosed.
    本发明揭示了同时含有光引发剂基团和增粘剂基团的化合物,以及含有它们的涂层配方,特别是用于卷板涂层的耐用紫外光固化底漆层。其中一种实施例包括包括金属基底的涂层金属表面,其至少有一个表面紧邻包含光引发剂化学结合到增粘剂的涂层层的金属基底。
  • POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
    申请人:FUJIFILM CORPORATION
    公开号:US20140005409A1
    公开(公告)日:2014-01-02
    A compound represented by the following formula (I): wherein in formula (I), R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group, a sulfo group, a cyano group, an aryl group or a heteroaryl group; R 2 represents an alkyl group or an aryl group; each of R 3 and R 4 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, a carbonyl group or an aryl group; X represents —O—, —S—, —NH—, —NR 5 —, —CH 2 —, —CR 6 H— or —CR 6 R 7 —; each of R 5 to R 7 independently represents an alkyl group or an aryl group; and R 1 and any one of R 5 to R 7 , or R 3 and R 4 , may be bonded to each other to form a ring.
    化合物的化学式为(I):在化学式(I)中,R1代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、酰基、氨基羰基团、磺胺基团、磺基、氰基、芳基或杂环芳基;R2代表烷基基团或芳基;R3和R4中的每一个独立代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、羰基或芳基;X代表—O—、—S—、—NH—、—NR5—、—CH2—、—CR6H—或—CR6R7—;R5到R7中的每一个独立代表烷基基团或芳基;R1和R5到R7中的任意一个,或R3和R4,可以相互连接形成环。
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